本計畫為” 搖擺式雙極離子鍍膜技術應用於3D 曲面玻璃之研究(第二年)”，研究目標是以新型雙極離子鍍膜系統配合搖擺式基板載台克服不同R 角的3D 曲面玻璃形狀限制，使其3D 曲面玻璃表面薄膜厚度達到高均勻性之成果。為達成此目的，本計畫將分為兩年執行，第一年已獲通過之計畫進行新型雙極離子鍍膜系統以達成均勻性之提升，以此方式可以適用於2.5D 曲面玻璃或較為平整(即R 角較大)之3D 曲面玻璃；本次申請之第二年計畫將結合搖擺式基板載台進行新型雙極離子鍍膜系統以達成均勻性之提升，以此方式可以適用於較為彎曲(即R 角較小)之3D 曲面玻璃。其中雙極離子鍍膜技術由電漿理論與技術為出發，建立雙極性濺鍍槍之後，測試其膜厚均勻性、濺鍍槍反應性，之後再建立雙極性電漿濺鍍系統，探究不同氣體的電漿對薄膜的交互作用與影響而找出最適合濺鍍的參數，並建立濺鍍不同光學薄膜材料之光學常數的完整資料庫，最後鍍製多層抗反射薄膜於3D 曲面玻璃基板。而搖擺式基板載台將利用本計畫建立之膜厚分布模型，計算雙極性濺鍍槍之公自轉膜厚分布，並實際測試其膜厚均勻性，之後再建立不同搖擺模式電漿濺鍍系統，探究不同搖擺模式與週期對薄膜的膜厚均勻性影響而找出最適合之搖擺參數，最後鍍製無色差之多層抗反射薄膜於3D 曲面玻璃基板。 ;This is a proposal entitled of “Research on the bipolar plasma deposition technique with rocking substrate stage for the applications of 3D curved screen (2nd year)” regarding the improvement of the thickness uniformity of the thin film on the 3D curved screen. There are two methods to improve the thickness uniformity in this proposal, which are to apply the bipolar plasma deposition technique and to place the rocking substrate stage. The bipolar plasma deposition technique based on the theory of plasma can increase the plasma density by using tow phase-conjugate plasma guns. Different working gases and pressure can affect the plasma density and change the thickness distribution of the film. A data base of the optical materials fabricated by bipolar plasma deposition will be built up for the antireflection coating design. Besides, a rocking substrate stage will also be designed to improve the thickness uniformity of the thin film on the 3D curved screen. A deposition model will be set up to simulate the bipolar plasma deposition system with the rocking substrate stage to achieve an antireflection coating without chromatic difference on the 3D curved screen.
