先進UV平行曝光裝置之智慧曝光技術研究;Research for an Intelligent Exposure Technology of an Advanced Uv Collimated Exposure Unit

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題名:	先進UV平行曝光裝置之智慧曝光技術研究;Research for an Intelligent Exposure Technology of an Advanced Uv Collimated Exposure Unit
作者:	陳奇夆
貢獻者:	國立中央大學機械工程學系
關鍵詞:	智慧調變;預先補償;曝光機;紫外光發光二極體;準直;均勻度;intelligent exposure optimized;UV-LED;automation;virtual factory
日期:	2018-12-19
上傳時間:	2018-12-20 14:01:37 (UTC+8)
出版者:	科技部
摘要:	本計畫為三年期，目標希望利用光場函數化技術和智慧型曝光優化技巧，開發一先進UV平行曝光裝置之智慧曝光技術，以UV-LED當作光源，利用工業革命4.0中的虛擬工廠設計與自動化系統概念整合設計出一套智慧型曝光機的光學系統，以節能與智慧調變為主軸，開發曝光機中最為關鍵的曝光系統，透過程式提前預測曝光時遇到的種種變因，並利用演算法預先計算以及補償的機制，使整個曝光製程的良率與品質顯著提升，達成工業4.0所強調的自動化與智慧化以及節能的效用。第一年擬開發平行曝光機中UV-LED光源系統設計，使用光線追跡方程計算設計準直透鏡，以及光場函數化的系統建立，撰寫演算法，使得系統能夠快速的找出在某一垂直高度、某一照射區域下光源與光源間的最佳間距，找出一最佳均勻度之解。第二年擬開發蜂巢式UV-LED面光源排列整合設計，並將UV-LED之衰變函數化，使用演算法對UV-LED光源系統進行控制，以對其輻射通量、光譜誤差做預先補償，再根據結果對演算法進行最佳化設計。第三年進一步考量UV-LED的製造公差、裝配誤差資料進行統計及分析，設計演算法對其進行做預先補償、以及整體系統的優化。 ;This is a three term project. The goal of this project is using light field function technique and intelligent exposure optimized technology to develop a Research for an intelligent exposure technology of an advanced PCB UV collimated exposure unit. Taking UV-LED as light source. Design an optical system with intelligent exposure unit by using virtual factory which is from industry 4.0 and automation system concept. We mainly focus on energy saving and intelligent modulation in order to develop exposure system which is the key point in exposure unit. Predict the problem which could happen in the process of exposure by programming in advance. Also, previously calculate and compensate by using algorithm in order to enhance the quality and yield rate to achieve the purposes which are automation, intelligence and energy saving of industry 4.0. First year, we’re going to develop UV-LED light source system. Using ray tracing function to design collimation lenses and light field function to construct system. Also, edit the algorithm to make the system could quickly find the best uniformity of illuminance and the best distance between light sources from certain vertical height and certain exposure area. Second year, we’re going to create cellular UV-LED flat light sources. Then, compiled a function which represents the decay of UV-LED. Using algorithm to control UV-LED light source system in order to previously recompense radiation flux and spectrum deviation. And then, according to the results to optimize the algorithm. Last year, by considering the tolerance of the manufacture process of UV-LED and tolerance of assemble , analyze and design a algorithm in order to previously recompense and optimize the whole system.
關聯:	財團法人國家實驗研究院科技政策研究與資訊中心
顯示於類別:	[機械工程學系] 研究計畫

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