成像光學系統的檢測，在現今的產業界中，缺乏一個完善的檢測儀器，針對光學系統中的各種製造誤差進行有效率的量測．光學系統的製造誤差包含了單一元件的偏心、傾角誤差與厚度誤差，以及各元件之間的偏心誤差、傾角誤差與距離誤差．現有的量測儀器中，包含了探針式表面輪廓儀、干涉儀、自準直儀與MTF檢測儀等，這些儀器均無法有效率且完整的檢測各種系統中的製造誤差． 本篇研究論文，提出了一個全場波前檢測架構，並使用本實驗室研究與開發多年的高動態範圍Shack-Hartmann波前檢測器，對一微型光學系統進行全視場的波前掃描．根據離軸像差理論，分析各視場的波前像差，進行全場像差多項式的數學擬合，並且實際驗證了離軸像差理論，分析出軸對稱設計系統中，因製造誤差所造成的非軸對稱誤差所產生的非軸對成像差，根據量測到的非軸對稱像差的數據，評估待測光學系統的系統誤差． 有別於其他光學檢測設備，此全場波前掃瞄系統可以應用於各種光學元件或是成像系統的檢測，無論是單片光學元件、組裝完成的光學成像鏡頭，或是未組裝完成的光學成像系統，並且可以得到高密度的全場波前像差之資料，是其他檢測設備無法達到的量測結果． ;Compared with the industry standard MTF consequential testing result, the full field transmitted wavefront testing is more analytical for field aberration analysis. A novel wavefront measuring device specialized for the miniature lens testing application is developed to measure the full field aberration in a high resolution of 35x36 radial-azimuthal fields. The device adapts the high dynamic range Shack-Hartman wavefront sensor to minimize the alignment uncertainty induced from collimator under high field angle. The plane symmetrical aberration due to elements misalignment are identified and quantified throughout the measured field. The resulting aberration field is therefore simply a combination of plane symmetric aberrations that do not necessarily share the same orientation for their respective plane of symmetry. The theory that describes the aberration of imaging optical system without symmetry including the effects of fabrication and assembly errors. As a result, the misaligned lens element inside lens barrel or the centering error of each single element induce the plane symmetric optical aberration throughout the optical field. The field constant coma and field linear astigmatism contributes most aberration errors to the edge of the field as expected. Through the field dependent aberration analysis. this device proves that the miniature lens image quality near the edge of the field is practically limited by the misalignment of the optical elements.
