微型複雜性結構光學元件之高均勻覆蓋性光學鍍膜技術;High Uniform Coverage Optical Coating Technology for Micro Complex Structural Optical Components

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题名:	微型複雜性結構光學元件之高均勻覆蓋性光學鍍膜技術;High Uniform Coverage Optical Coating Technology for Micro Complex Structural Optical Components
作者:	郭倩丞;卓文浩
贡献者:	國立中央大學光電科學與工程學系
关键词:	光學感測器;微型複雜性結構;原子層沉積技術;即時光學監控系統;顯微光譜量測系統;Optical sensors;micro-complex structures;atomic layer deposition techniques;in-situ optical monitoring systems;microscopic spectral measurement system
日期:	2020-01-13
上传时间:	2020-01-13 14:20:02 (UTC+8)
出版者:	科技部
摘要:	光學感測器是智慧檢測不可或缺的元素，而微型複雜性結構的光學元件是未來光學感測器的主要關鍵零組件，光學元件需要光學薄膜來提升光學成效，但目前廣泛使用的光學鍍膜技術無法滿足複雜性結構的需求，而原子層沉積技術(Atomic layer deposition, ALD)正是能夠解決這類問題的獨特技術，其沉積的薄膜具有極佳的均勻性及覆蓋性，本計畫主要是結合ALD及電漿增益ALD鍍膜技術鍍製低吸收的光學薄膜來完成微型複雜性結構光學元件的抗反射膜，運用區域選擇ALD鍍膜技術可以選擇沉積薄膜位置，並優化製程設備加入光學監控系統，即時監控光學薄膜成長狀況，建立顯微光譜量測系統，可針對微型複雜性結構光學元件的小面積進行量測，完成即時光學監控系統鍍製抗反射膜，其理論值與實際值的差異要小於5%，且420nm~680nm之間的平均反射率要低於0.5%，其膜厚均勻性在3%以內。 ;Optical sensors are an indispensable element of smart detection. Micro-complex structural optical components are the key components of future optical sensors. Optical components require optical films to enhance optical performance, but common optical coatings technology can't meet the needs of complex structures, and Atomic layer deposition (ALD) is a unique technology that can solve such problems. The deposited film has excellent uniformity and coverage. This project is a combination of ALD and plasma enhance ALD coating technology to deposit low-absorption optical film to complete the anti-reflection coating of micro-complex structure optical components. Selecting the location of the deposited film using the area-selective ALD coating technique. Using the optical monitoring system to optimize the equipment to in-situ monitoring the growth of optical films. Developing the microscopic spectral measurement system to measure small areas of micro-complex structural optical components. The average reflectance of anti-reflection coating of micro-complex structural optical components between 420 nm and 680 nm is less than 0.5%, the uniformity of thickness less than 3%, and the difference between theoretical and actual values Less than 5%.
關聯:	財團法人國家實驗研究院科技政策研究與資訊中心
显示于类别:	[光電科學與工程學系] 研究計畫

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