在這項研究中透過循環伏安法（CV）和掃描式穿隧電子顯微鏡（STM）於硫酸、過氯酸和鹽酸中研究了2-巰基-5-苯並咪唑磺酸（MBIS）與2-巰基苯并咪唑（MBI）吸附在金（111）上的空間結構，揭示了電位控制和分子濃度對吸附構型和表面排列的巨大影響。同時也探討了MBI分子和MBIS分子吸附在金（111）電極上對於電鍍銅的影響。 首先，透過STM觀察MBIS分子和MBI分子可形成有序分子膜，其單位晶格分別為（3√3 × 3√3）和（√3 × 5）。 MBIS分子和MBI分子的覆蓋度分別是0.11和0.23。MBIS分子比MBI分子更鬆散地組裝在金（111）上，這是由於磺酸根基團的排斥力，使分子間的相互作用更大。 其次，MBIS分子和MBI分子在硫酸和過氯酸中形成相同的有序結構，但在鹽酸中卻呈現無序。這種現象表明，陰離子深刻影響著MBIS分子和MBI分子的吸附。在另一項實驗結果中發現，當電解質中MBIS分子的濃度逐漸增加，MBIS分子的結構從有序變為無序。相反地，MBI分子結構並不受影響，在越來越高的分子濃度中（√3 × 5）的結構依然存在。 最後，MBIS分子和MBI分子都在低分子濃度下加速了銅在金（111）上的電沉積，但在高濃度下卻減緩了沉積速度。 ;In this study, the spatial structures of 2-Mercapto-5-benzimidazolesulfonic acid (MBIS) and 2-Benzimidazolethiol (MBI) adsorbed on Au(111) have been investigated by cyclic voltammetry (CV) and scanning tunneling microscopy (STM) in sulfuric, perchloric and hydrochloric acids, revealing the immense effects of potential controlled and molecular concentration on the adsorption configuration and surface arrangement. The effects of MBI and MBIS adsorbed on a Au(111) electrode on copper electroplating are exaamined. First, MBIS and MBI form order molecular films, whose unit cells are (3√3 × 3√3) and (√3 × 5), as characterized by STM. The coverage of MBIS and MBI is 0.11 and 0.23. MBIS is more loosely packed on Au(111) than MBI, suggesting a greater repulsive intermolecular interaction due to the sulfonate group. Secondly, both MBIS and MBI form the same ordered structure in sulfuric and perchloric acids, but they are disordered in hydrochloric acid. This phenomenon indicates a profound effect of anion is the adsorption of MBIS and MBI. In one experiment, where the concentration of MBIS is gradually increased in the electrolyte, the MBIS structure changes from ordered to disordered. In contrast, but the MBI structure is not affect and the structure of (√3 × 5) stays with increasingly higher concentration. Finally, both MBIS and MBI accelerate the electrodeposition of copper on Au(111) at low molecular concentration, but slow down at high concentration.
