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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/83525

    Title: 電漿輔助原子層沉積法鍍製抗反射膜於微型塑膠透鏡;Plasma Enhanced Atomic Layer Deposition of Antireflection coatings on Micro plastic lens
    Authors: 劉子凡;Liu, Tzu-Fan
    Contributors: 光電科學與工程學系
    Keywords: 電漿輔助原子沉積;抗反射膜;Plasma Enhanced Atomic Layer Deposition;Antireflection coating
    Date: 2020-08-20
    Issue Date: 2020-09-02 15:46:16 (UTC+8)
    Publisher: 國立中央大學
    Abstract: 近年來半導體產業的快速發展對線寬的要求越來越小,原子層沉積
    結構的光學元件在製造時使用成本較低的塑膠(如 PMMA、PC、Zeonex)
    本實驗使用電漿輔助原子層沉積法鍍製,探討了單層膜在 60℃製程
    60℃製程下的反應性,並使用 X 射線光電子能譜儀分析薄膜中殘留的
    鏡上,並使用顯微鏡光譜儀量測透鏡各點在波段 420nm 到 680nm 抗反
    射光譜圖及均勻性,平均反射率約為 0.78%。;In recent years, due to the rapid development of the semiconductor
    industry, the requirements for line width have become lesser. Atomic Layer
    Deposition technology developed rapidly because of its excellent
    uniformity and shape retention.
    In optical applications, as the optical design structure becomes more
    complex, more Freeform surface or structured lenses have appeared to
    replace of optical components. In order to reduce costs during
    manufacturing, plastic substrates (such as PMMA, PC, Zeonex) are used
    instead of glass.
    In this experiment, plasma-enhanced atomic layer deposition method
    was used. The trend of refractive index and extinction coefficient of
    single-layer film under 60℃ process with different power and process time
    was discussed. The reactivity of the precursors at 60℃ was also analyzed.
    The use of XPS to analyze the residual carbon and nitrogen ratio in the
    film to infer whether its impurities affect the optical properties. The
    anti-reflection (AR) coating with different parameters is deposited on the
    plastic substrates to test its adhesion and film cracking.
    Finally, the AR film coated on the micro plastic lens is used to
    measure the anti-reflection spectrum and uniformity of each point of the
    lens in the wavelength range of 420 nm to 680 nm with an optical
    microscope spectrometer. The average reflectance is about 0.78%.
    Appears in Collections:[光電科學研究所] 博碩士論文

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