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    題名: 以溶劑鑄膜法製成PQ:PMMA薄膜之光化學反應模型;Photochemical Reaction Model of PQ:PMMA Film Fabricated by Solvent Casting
    作者: 鄭詠程;Cheng, Yung-Cheng
    貢獻者: 光電科學與工程學系
    關鍵詞: 體積布拉格光柵;溶劑鑄膜法;Volume Bragg grating;PQ:PMMA;VBG;Solvent casting
    日期: 2021-01-18
    上傳時間: 2021-03-18 17:03:03 (UTC+8)
    出版者: 國立中央大學
    摘要: 本研究計畫達到的目標有兩項。第一項為開發PQ:PMMA感光高分子膜的溶劑鑄膜法製程。利用四氫?喃作為有機溶劑溶解PMMA粉末與PQ粉末而形成鑄膜溶液,使用刀刮法將PQ:PMMA濕膜塗佈於玻璃基板上,進行揮發固化成膜,最終完成PQ:PMMA膜的製備。
    第二項,使用溶劑鑄膜法製成之PQ:PMMA光化學反應模型。依照PQ:PMMA膜的材料特性更改舊有光化學反應模型。藉由PQ:PMMA膜光化學反應模型進行模擬分子濃度空間分佈、分子濃度分佈的第一階傅立葉係數、折射率空間分佈的第一階傅立葉係數。使用雙光束干涉實驗對PQ:PMMA膜記錄體積布拉格光柵(VBG),並且藉由模型擬合的方式,對實驗數據進行參數擬合找出最佳的樣品製程條件。最後,使用最佳曝光時間條件與最佳製程條件進行記錄,製作出更高折射率變化量的PQ:PMMA膜VBG。
    ;In this research, the two goals were proposed. The first one is the solvent casting process of PQ:PMMA photopolymer film. PMMA powder and 9,10-phenanthrenequinone(PQ) powder are dissolved in oxolane(THF) to form the casting solution. With Doctor-blade coating, the wet film is coated on the glass substrate. During evaporation in the oven, the PQ:PMMA film is formed.
    The second one is the modeling of PQ:PMMA film fabricated by solvent casting method. The photochemical reaction rate equations were written down. The distribution of molecule concentration under different initial conditions could be simulated by the rate equations. The simulation can further be used to determine the refractive index distribution of PQ-PMMA. Finally, using Fourier series analysis, the 1st order Fourier coefficient of refractive index distribution can be estimated. Experimentally, using two beam interference, the volume Bragg grating(VBG) is recorded in the PQ:PMMA film. Relies on model fitting of experimental data, the best fabrication parameters and exposure time conditions could be find out. Finally, the higher refractive index modulation of VBG could be recorded.
    顯示於類別:[光電科學研究所] 博碩士論文

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