本論文依據實驗室所開發之微陽極引導電鍍(Micro Anode Guided Electroplating, MAGE)技術來製造(1)鎳鉻合金微螺旋結構來研究其熱穩定性；(2)銅微米柱，進而在表面電鍍氧化鋅，開發氣體偵測器；(3)鋁摻雜之氧化鋅(Al：ZnO)半導體奈米柱薄膜。MAGE技術，主要在微陽極與基材間，設定偏壓於小間隙(小於100 μm)下進行電鍍。此製程有別於傳統電鍍法，可在超高電場強度(?106 V / m)及高電流密度(> 10 A/cm2)進行鎳鉻合金析鍍，有利於產生奈米晶和非晶結構。結果顯示: (1) 在商用鎳鉻絲上析鍍出鎳鉻合金微螺旋旋，經通電加熱超過1200°C時，商用鎳鉻絲已遭熔斷，本製程所得鎳鉻合金微螺旋卻仍完好如初，具有優異之熱穩定性。 (2) 在銅微柱表面電鍍一層氧化鋅奈米柱後，具有優良之氣體偵性能。此氣體偵測器之靈敏度隨氧化鋅奈米柱之高寬比(aspect ratio)而定，當其高寬比高達3.8時，於300 °C下，偵測一氧化碳由5 ppm增加至25 ppm時，響應值由2.38上升至3.43，偵測靈敏度大幅上升。 (3) 所得鋁摻雜之電鍍氧化鋅薄膜，明顯受鍍浴中[Al3+]濃度影響而得到三種不同相：[Al3+] < 60 μm時，得到緻密奈米柱結構；60 μM < [Al3+] < 100 μM時，獲得奈米柱及奈米片之混合相；[Al3+] > 250μM時，得到鬆散絮狀物相。摻雜2.84 at. % Al的奈米柱顯示出最高的載子濃度(3.83×1018 cm-3)。 ;Microanode Guided Electroplating (MAGE), developed in our laboratory, was employed to (1) fabricate Ni-Cr alloy for studying its thermal stability; (2) prepare Cu micropillar whose surface was deposited with ZnO nanorod for the use of gas-sensor; (3) manufacture semiconducting (Al：ZnO) film. Through MAGE, a few volts were applied at a tiny gap (<100μm) between the microanode and the substrate to conduct the electrodeposition. This is quite different from traditional electrodeposition because it performs in an ultrahigh strength of electric field (?106 V / m) and current density ( > 10 A/cm2) thus taking the advantage to form deposits in amorphous or nano-phases. The results are as follows. (1) After a test of Joule-heating over 1200°C, the Ni-Cr alloy microhelix deposited on a wire of commercial Nichrome showed no harm, but the commercial one has been burnt out. Superior thermal stability of the Ni-Cr alloy microhelix is attributed to its amorphous and nano phases. (2) A sensor made of Cu micropillar whose surface deposited with a film of ZnO-nanorods demonstrated a good sensor of CO-gas. The sensitivity of the sensor was determined by the aspect ratio of the ZnO nanorods. At an aspect ratio of 3.8, the sensor showed the highest sensitivity. With increasing the concentration of CO from 5 ppm to 25 ppm at 300 °C, the response increased significantly from 2.38 to 3.43. (3) Three typical phases of the electrodeposited Al-doped ZnO films were attained determined by the concentration of [Al3+] in the bath. (i). a compact nanorods phase resulted from the bath with [Al3+] < 60μM; (ii) a mixture of nanorods and nanosheets obtained in the bath with 60μM< [Al3+] < 100μM, and (iii) a loose phase of cloudy flocs resulted from the bath with [Al3+] > 250μM. The ZnO nanorods doped with 2.84 at. % Al showed the highest carrier concentration (3.83×1018 cm-3)
