參考文獻 |
[1] S. Wolf, Silicon Processing for the VLSI Era, Vol. I, Lattice Press, 1986.
[2] S. Sze, VLSI Technology, McGraw Hill, New York, 1988.
[3] A. Mukherjee, Introduction to NMOS & CMOS VLSI System Design, Prentice-Hall, Englewood Cliffs, 1986.
[4] D. J. Elliot, Integrated Circuit Fabrication Technology, 2nd Ed., Mc Graw-Hill, 1989.
[5] A. G. Emslie, F. T. Bonner, and L. G. Peck, “Flow of a Viscosity Liquid on a Rotating Disk”, Journal of Applied Physics, 29 (1958) 858.
[6] E. Momoniat and D. P. Mason, “Investigation of the Coriolis Force on a Thin Fluid Film on a Rotating Disk”, International Journal of Non-Linear Mechanics, 31 (1998) 1069.
[7] M. Yanagisawa, “Slip Effect for Thin Liquid Film on a Rotating Disk”, Journal of Applied Physics, 61 (1978) 1034.
[8] A. Acrivos, M. Shan, and E. E. Petersen, “On The Flow of a Non-Newtonian Liquid on a Rotating Disk”, Journal of Applied Physics, 31 (1960) 963.
[9] D. E. Bornside, C. W. Maccsko, and L. E. Scriven, “Spin Coating: One-Dimensional Model”, Journal of Applied Physics, 66 (1989) 5185.
[10] D. Meyerhofer, “Characteristics of Resist Films Produced by Spinning”, Journal of Applied Physics, 49 (1978) 3993.
[11] W. W. Flack, D. S. Soong, A. T. Bell, and D. W. Hess, “A Mathematical Model for Spin Coating of Polymer Resist”, Journal of Applied Physics, 56 (1984) 1199.
[12] C. T. Wang and S. C. Yen, “Theoretical Analysis of Film Uniformity in Spinning Processes”, Chemical Engineering Science, 50 (1995) 989.
[13] J. H. Hwang and F. Ma, “On The Flow of a Thin Liquid Film over a Rough Rotating Disk”, Journal of Applied Physics, 66 (1989) 388.
[14] J. H. Hwang and F. Ma, “On The Depletion of a Thin Liquid Film Over a Rough Rotation Disk”, Mechanics Research Communications, 17 (1990) 423.
[15] B. G. Higgins, “Film Flow on a Rotating Disk”, Physics of Fluids, 29 (1986) 3522.
[16] D. P. Birnie, S. K. Hau, D. S. Kamber, and D. M. Kaz, “Effect of Ramping-up Rate on Film Thickness for Spin-on Processing”, Journal of Materials Science: Materials in Electronics, 16 (2005) 715.
[17] T. Yada, T. Maejima, and M. Aoki, “Formation of a Positive Photoresist Thin Film by Spin Coating: Influence of Atmospheric Humidity”, Japanese Journal of Applied Physics, 36 (1997) 7041.
[18] T. Yada,, T. Maejima, M. Aoki, and M. Umesaki, “Thin-Film Formation by Spin Coating: Characteristics of a Positive Photoresist”, Japanese Journal of Applied Physics, 34 (1995) 6279.
[19] T. Yada, M. Aoki, T. Maejima, and A. Ishizu, “Formation of a Positive Photoresist Thin Film by Spin Coating: Influence of Atmospheric Temperature”, Japanese Journal of Applied Physics, 36 (1997) 372.
[20] T. Yada, “Formation of a Negative Photoresist Thin Film by Spin Coating”, Japanese Journal of Applied Physics, 37 (1998) 2752.
[21] C. J. Lawrence, “The Mechanics of Spin Coating of Polymer Films”, Physics of Fluids, 31 (1988) 2786.
[22] R. K. Yonkoski and D. S. Soane, “Model for Spin Coating in Microelectronic Applications”, Journal of Applied Physics, 72 (1992) 725.
[23] J. Gu, M. D. Bullwinkel, and G. A. Campbell, “Spin Coating on Substrate with Topography”, Journal of Electrochemical Society, 142 (1995) 907.
[24] R. U. Madras and T. G. Kaiserslautern, “Spinning of a Liquid Film From a Rotating Disc in The Presence of a Magnetic Field - A Numerical Solution”, Acta Mechanica, 147 (2001) 137.
[25] S. M. Troian, E. Herbolzheimer, S. A. Safran, and J. F. Joanny, “Fingering Instabilities of Driven Spreading Film”, Europhysics Letters, 10 (1989) 25.
[26] L.W. Schwartz, “Viscous Flow Down an Inclined Plane: Instability and Finger Formation”, Physics of Fluids A, 3 (1989) 443.
[27] F. Melo, J. F. Joanny, and S. Fauve, “Fingering Instability of Spinning Drops”, Physics Review Letters, 63 (1989) 1958.
[28] N. Fraysse and G. M. Homsy, “An Experimental Study of Rivulet Instabilities in Centrifugal Spin Coating of Viscous Newtonian and Non-Newtonian Fluids”, Physics of Fluids, 6 (1994) 1491.
[29] M. A. Spaid and G. M. Homsy, “Stability of Viscoelastics Dynamic Contact Lines: An Experiment Study”, Physics of Fluids, 9 (1997) 823.
[30] Y. D. Shikhmurzaev, “Spreading of Drop on Solid Surface in a Quasi-Static Regime”, Physics of Fluids, 9 (1997) 266.
[31] S. K. Wilson, R. Hunt, and B. R. Duffy, “The Rate of Spreading in Spin Coating”, Journal of Fluid Mechanics, 413 (2000) 65.
[32] F. C. Chou, P. Y. Wu, and S. C. Gong, “Analytical Solutions of Film Planarization during Spin Coating”, Japanese Journal of Applied Physics, 37 (1998) 4321.
[33] P. Y. Wu and F. C. Chou, “Complete Analytical Solutions of Film Planarization during Spin Coating”, Journal of Electrochemical Society, 146 (1999) 3819.
[34] M. W. Wang and F. C. Chou, “Fingering Instability and Maximum Radius at High Rotational Bond Number”, Journal of Electrochemical Society, 148 (2001) G283.
[35] S. Middleman, “The Effect of Induced Air-Flow on The Spin Coating of Viscous Liquids”, Journal of Applied Physics, 62 (1987) 2530.
[36] M. Yanagisawa, “Slip Effect for Thin Liquid Film on a Rotating Disk”, Journal of Applied Physics, 61 (1987) 1034.
[37] T. J. Rehg, and B. G. Higgins, “The Effect of Inertia and Interfacial Shear on Film Flow on a Rotating Disk”, Physics of Fluids, 31 (1988) 1360.
[38] W. H. McConnell, “On The Rate of Thinning of Thin Liquid Films on a Rotating Disk”, Journal of Applied Physics, 64 (1988) 2232.
[39] F. Ma and J. H. Hwang, “The Effect of Air Shear on The Flow of a Thin Liquid Film over a Rough Rotating Disk”, Journal of Applied Physics, 68 (1991) 1265.
[40] S. C. Gong and F. C. Chou, “Effect of Wind shear on The Film Thickness Distribution over Rotating Doughnut Disks”, Japanese Journal of Applied Physics, 36 (1997) 380.
[41] F.C. Chou and P.Y. Wu, “Effect of Air Shear on Film Planarization During Spin Coating”, Journal of Electrochemical Society, 147 (2000) 699.
[42] M. M. J. Decre and G. M. Vromans, “Cover Layer Technology for The High-Numerical-Aperture Digital Video Recording System”, Japanese Journal Applied Physics, 39 (2000) 775.
[43] T. Komaki, H. Hirta, M. Usami, T. Ushida, and N. Hayashida, “Spin-coating Technology of The Cover Layer for Digital Video Recording-Blue Disc”, Japanese Journal of Applied Physics, 41 (2002) 3922.
[44] F. C. Chou, M. W. Wang, S. C. Gong, and Z. C. Yang, “Reduction of Photoresist Usage During Spin Coating”, Journal of Electronic Materials, 4 (2001) 432.
[45] M. Sanada, K. Nakano, and M. Matsunaga, “Characteristics of Material For Photoresist Spin Coating: Property For Reduction of Photoresist Consumption”, Japanese Journal of Applied Physics, 37 (1998) L1448.
[46] B. Lorefice, D. Chen, B. Mullen, E. Gurer, R. Savage, and R. Reynolds, “How to Minimize Resist Usage During Spin Coating”, Semiconductor International, 21 (1998) 179.
[47] J. A. Th. Verhoeven and W. S. Mischke, “Developments in CD-R”, Proceedings Fifth SPIE International Symposium on Optical Storage, 4085 (2001) 298.
[48] N. P. Pham, L. M. Scholtes, R. Klerk, P.M. Sarro, J. N. Burghartz, and B. Wieder, “Direct Spray Coating of Photoresist for MEMS Applicaions”, Proceedings of SPIE - The International Society for Optical Engineering, 4557 (2001) 312.
[49] N. P. Pham, E Boellaard, J. N. Burghartz, and P. M. Sarro, “Photoresist Coating Methods for The Integration of Novel 3-D RF Microstructure”, Journal of Microelectromechanical Systems, 13 (2004) 491.
[50] T. Luxbache and A Mirza, “Spray Coating for MEMS Interconnect & Advanced Packaging Applications”, Sensors, 16 (1999) 61.
[51] J. Derksen, S. Han, and J. H. Chun, “Extrusion-Spin Coating: An Efficient Photoresist Coating Process for Wafers”, Proceedings IEEE International Symposium on Semiconductor Manufacturing Conference, (1999) 245.
[52] S. Han, J. Derksen, and J. H. Chun, “Extrusion Spin Coating: An Efficient and Deterministic Photoresist Coating Method in Microlithography”, IEEE Transactions on Semiconductor Manufacturing, 17 (2004) 12.
[53] K. Takahiro, “Novel Coating Apparatus using Nozzle-Scan Technique”, IEEE International Symposium on Semiconductor Manufacturing Conference, Proceeding, 1 (2000) 395.
[54] S. Hiroshi, I. Takayuki, W. Yukihiro, S. shinichi, and K. Takahiro, “Evaluation of Resist-Film Property by Scan and Spin Coating”, Proceedings of SPIE – Advances in Resist Technology and Process XXI, 5376 (2004) 939.
[55] T. E. Adams and E. Pa, “Method of Spiral Resist Deposition”, U.S. Patent 5395803 (1995).
[56] T. E. Adams and E. Pa, “Method of Spiral Resist Deposition”, U.S. Patent 5532192 (1995).
[57] A. Curtis, P. Bisson, C. Hamel, and E. Hughlett, “Minimum Consumption Wafer Coating”, Proceedings 8th IEEE International Symposium on Advanced Packaging Materials, (2002) 302.
[58] F. C. Chou and K. H. Huang, “Reduction of Amount of Dye During Spin Coating”, Japanese Journal of Applied Physics, 45 (2006) 1757.
[59] D. E. Bornside, R. A. Brown, P. W. Ackmann, J. R. Frank, A. A. Tryba, and F. T. Geyling, “The Effect of Gas Phase Convection on Mass Transfer in Spin Coating”, Journal of Applied Physics, 73 (1993) 585.
[60] D. E. Bornside, “Mechanism for the Local Planarization of Microscopically Rough Surfaces by Drying Thin Films of Spin-Coated Polymer/Solvent Solutions”, Journal of the Electrochemical Society, 137 (1990) 2589. |