磨料噴射精微加工之研究

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姓名

蔡逢哲(Feng-Che Tsai) 查詢紙本館藏

畢業系所

機械工程學系

論文名稱

磨料噴射精微加工之研究
(A Study on Abrasive Jet Technology for Micro-Machining)

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摘要(中)

本研究主要研發一套磨料噴射精微拋光技術，並利用自行研發具滑動研磨功能之蠟砂，探討對不同SKD61模具鋼加工及形狀表面的拋光改善效果。經由實驗發現採用田口方法所獲得之磨料噴射最適參數水準組合，以#2000SiC與添加劑混合比例500: 1000: 1500(水蠟: 磨料: 水)條件下，可於90 min內將表面粗糙度7.74 μm Rmax的放電表面改善至0.45 μm Rmax，且表面呈現近似鏡面反射效果。對於2.32 μm Rmax開放式微槽、3.45 μm Rmax直線型封閉式微槽與3.58 μm Rmax曲線型封閉式微槽表面，以#3000SiC磨粒在相同加工條件下，可分別於30 min、60 min與60 min時，將表面改善至0.40 μm Rmax、0.43 μm Rmax與0.45 μm Rmax的拋光效果。同時研究創新以霧化法製作具滑動功能的複合磨料(#3000蠟砂)，發現經磨料噴射後對於表面粗糙度3.26 μm Rmax的研磨表面，可於拋光時間45 min內，將表面改善至0.31 μm Rmax的鏡面效果；另外對於2.32 μm Rmax的開放式微槽、3.45 μm Rmax的直線型封閉式微槽與3.58 μm Rmax的曲線型封閉式微槽表面，分別於30 min、60 min和75 min時，可將表面改善至0.31 μm Rmax、0.35 μm Rmax與0.40 μm Rmax的表面拋光效果，證明磨料噴射拋光法結合蠟砂複合磨料，可明顯縮短拋光時間並獲得極佳的表面改善效果。

摘要(英)

This study introduces an Abrasive Jet Polishing (AJP) technique to improve the polishing performance. Furthermore, a Gas Atomization technique is employed to fabricate Wax-coated #3000SiC particles, investigations to establish the optimal AJP parameters for the surface finishing of different SKD61 mold steel specimens shape and processed.
Taguchi design experiments are performed to identify the optimal AJP parameters when applied to the polishing of SKD61 mold steel specimens. Using #2000SiC particles were mixed with water wax and pure water in a ratio of 500: 1000: 1500 (Water Wax: SiC particles: Pure Water). Following 90 minutes of blasting, the surface roughness is improved from an initial value of 7.74 μm Rmax to 0.45 μm Rmax, thereby obtain a mirror-like surface finish. AJP polishing of the micro-grooving SKD61 surface, Linear type micro-channel SKD61 surface and Curvee type micro-channel SKD61 surface using #3000SiC particles mixed with water wax and pure water in the ratio 500:1000:1500 (Water Wax: SiC particles: Water) reduces the surface roughness from an initial value of Rmax = 2.32 μm, Rmax = 3.45 μm and Rmax = 3.58 μm to a final value of Rmax = 0.40 μm, Rmax = 0.43 μm and Rmax = 0.45 μm within 30 minutes, 60 minutes and 60 minutes, respectively. Gas Atomization system used in this study to fabricate the Wax-coated #3000SiC particles. AJP polishing of the ground SKD61 surface using wax-coated #3000SiC particles mixed with water wax and pure water in the ratio 500: 1000: 1500 (Water Wax: SiC particles: Water) reduces the surface roughness from an initial value of Rmax = 3.26 μm to a final value of Rmax = 0.31 μm within 45 minutes. In addition, using wax-coated #3000SiC particles of the micro-grooving SKD61 surface, Linear type micro-channel SKD61 surface and Curvee type micro-channel SKD61 surface reduces, the surface roughness from an initial value of Rmax = 2.32 μm, Rmax = 3.45 μm and Rmax = 3.58 μm to a final value of Rmax = 0.31 μm, Rmax = 0.35 μm and Rmax = 0.40 μm within 30 minutes, 60 minutes and 75 minutes, respectively. Overall, the results show that the use of wax-coated abrasive particles reduces the polishing time and achieves an improved surface finish.

關鍵字(中)

★ 霧化法
★ 磨料噴射加工
★ 放電加工
★ 田口品質工程

關鍵字(英)

★ Gas Atomization
★ Taguchi Method
★ Abrasive Jet Machining
★ Electrical Discharge Machining

論文目次

摘要 i
Abstract ii
謝誌 iv
目錄 v
圖目錄 viii
表目錄 xiii
第一章緒論 1
1-1 研究背景 1
1-2 研究動機與目的 4
1-3 文獻回顧 6
1-3-1 放電表面改善 6
1-3-2 拋光技術 8
1-3-3 磨料噴射加工法 10
1-3-4 田口實驗計畫法 13
1-4 研究方法 15
1-4-1 實驗材料 16
1-5 本論文之構成 19
第二章磨料噴射精微拋光系統之建構 21
2-1 前言 21
2-2 磨料噴射加工法基本原理 22
2-2-1 磨料噴射對延性工件材料移除機制 24
2-3 系統設計與建構 24
2-4 磨料噴射精微拋光系統 26
2-5 系統性能與加工特性分析 27
2-5-1 系統入出口壓力差異 29
2-5-2 乾式與濕式加工對表面粗糙度之影響 32
2-5-3 加工高度對磨料噴射加工能力之影響 34
2-6 結論 36
第三章磨料噴射精微拋光法對於不同加工平面之改善 37
3-1 前言 37
3-2 放電加工原理 37
3-2-1 放電加工材料去除機制 39
3-3 實驗方法 41
3-4 結果與討論 42
3-4-1不同放電表面粗糙度對表面精微拋光之影響 42
3-4-2水溶性加工油添加劑對放電表面精微拋光之影響 47
3-4-3 不同磨料號數對放電表面精微拋光之影響 52
3-4-4 不同磨料種類對放電表面精微拋光之影響 58
3-4-5 表面特性探討 61
3-4-5-1 微硬度試驗 61
3-4-5-2表面微量元素分析 64
3-4-5-3 腐蝕試驗與再鑄層觀察 65
3-4-6水蠟添加劑對放電表面精微拋光之影響 67
3-4-7 不同磨料號數粒徑對放電表面精微拋光之影響 69
3-4-8水蠟添加劑對研磨表面精微拋光之影響 71
3-4-9 不同磨料號數對研磨表面精微拋光之影響 73
3-4-10 腐蝕試驗與截面觀察 76
3-5 結論 79
第四章磨料噴射精微拋光法應用於自由曲面之精修 81
4-1 前言 81
4-2 實驗原理 82
4-3 實驗方法與材料 83
4-4 結果與討論 85
4-4-1 開放式微槽拋光 85
4-4-1-1 不同磨料號數對開放式微槽拋光改善效果 86
4-4-2 直線型封閉式微槽拋光 88
4-4-2-1 真空吸引力對直線型封閉式微槽拋光的影響 89
4-4-2-2 不同磨料號數對直線型封閉式微槽拋光的影響 90
4-4-3 曲線型封閉式微槽拋光 93
4-4-3-1 不同磨料號數對曲線型封閉式微槽拋光之影響 93
4-5 結論 96
第五章蠟砂磨料研發與精微拋光效果探討 97
5-1 前言 97
5-2 霧化法原理 98
5-3 實驗方法與材料 99
5-4 結果與討論 100
5-4-1 蠟砂對研磨表面拋光之影響 100
5-4-1-1 蠟砂與不同號數單一材質SiC磨粒對於研磨表面改善效果 101
5-4-1-2 微硬度試驗 105
5-4-1-3 表面微量元素分析 107
5-4-1-4腐蝕實驗 109
5-4-2 蠟砂對開放式微槽拋光之影響 109
5-4-3 蠟砂對直線型封閉式微槽拋光之影響 111
5-4-4 蠟砂對曲線型封閉式微槽拋光之影響 114
5-5 結論 117
第六章總結論 118
參考文獻 120
附錄A 磨料噴射加工參數最適化 130
作者簡介 138

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指導教授

顏炳華(Biing-Hwa Yan)

審核日期

2008-6-4

推文