應用在光連接具有高可靠度高速(>25Gbit/sec)  850光波段的垂直共振腔雷射

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江嘉偉(Jia-Wei Jiang) 查詢紙本館藏

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電機工程學系

論文名稱

應用在光連接具有高可靠度高速(>25Gbit/sec) 850光波段的垂直共振腔雷射
(High-Reliability and High-Speed (>25Gbit/sec) 850nm Vertical-Cavity Surface-Emitting Laser (VCSELs) for the Application of Optical Interconnect)

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摘要(中)

近來，我們開發850奈米垂直共振雷射(VCSEL)高可靠度高速(>25Gbit/sec)及窄光譜寬度和低功率損耗，主要有兩個重要的製程步驟，第一是鋅擴散第二是水氧化步驟，用來侷限光場及電流侷限在我們VCSEL架構上。而要在P-DBR得到好的鋅擴散輪廓，需要品質好的氮化矽薄膜，所以我們在不同的電漿氣象沉積機台做了不同的實驗來得到所要求的薄膜。關於水氧化實驗，主要問題是氧化孔大小的在晶圓上的均勻性，我們使用自製的水氧化系統做了測試，在3.5cm×3.5cm的範圍下所得到的誤差值為正負0.75um是相當好的均勻性。
我們開發獨特的製程架構及高品質850nm VCSELs晶圓，主要改變是將磊晶層成長在半絕緣基板上，及較短的共振腔(0.5)和再主動層加入了應力(15%)，達到低操作電流(7.92 kA/cm2)和低能量數據傳輸比(EDR:224fJ/bit)，以證明850奈米VCSEL在85 ℃的操作下可達到>41Gbit/sec傳輸，這成就將導致數據中心的通信蓬勃發展在市場上產生強烈衝擊。

摘要(英)

In this work, we develop key steps for the mass production of high-reliability, high-speed (> 25 Gbit/sec), narrow spectral width, and low power consumption 850 nm vertical-cavity surface-emitting laser (VCSEL). There are two main unique fabrication steps of our VCSELs. One is Zn-diffusion and the other is wet-oxidation (relief) for optical and current-confined apertures in our VCSEL structure, respectively. In order to get well-controlled Zn-diffusion profile in the DBR layers of VCSEL to manipulate the number of optical modes inside cavity, a high-quality Si3N4 film has been developed by using different CVD systems and implemented in the device fabrication processes. Regarding with the wet-oxidation process, its major concern is in the uniformity of the aperture size across the whole wafer. A home-made wet-oxidation system has been developed to meet such challenge and a good uniformity (±0.75um) in the fabricated VCSEL wafers with (3.5cm×3.5cm) area has been demonstrated.
By use of the well-developed unique fabrication processes and high-quality 850 nm VCSELs wafers grown on semi-insulating GaAs substrate with short-l (0.5 ) cavity structure and highly strain active layers (15%), record low driving current density (7.92 kA/cm2) and record low energy to data rate ratio (EDR: 224fJ/bit) has been demonstrated for > 41 Gbit/sec operation of 850 nm VCSEL from room-temperature to 85 ℃ operations. This achievement would result in strong impact on the booming market of communication in data center.

關鍵字(中)

★ 半導體雷射
★ 垂直式共振腔雷射

關鍵字(英)

★ laser
★ VCSEL

論文目次

目錄
摘要 i
Abstract ii
致謝 iii
目錄 iv
第一章序論 1
1-1 簡介 1
1-2 光連結應用 1
1-3 面射型雷射簡介 2
1-4 面射型雷射的電流侷限 4
1-5 氧化層的結構技術 6
第二章理論 9
2-1 VCSEL的磊晶結構 9
2-2 鋅擴散於DBR 12
2-3 VCSEL的選擇性水氧化理論 16
2-4 水氧層掀離製作 18
2-5 高速單模態VCSEL製作 19
2-6 水氧化系統 24
2-7 IR系統 25
2-8 發散角 26
第三章量測結果與討論 29
3-1量測系統 29
3-1-1. 電流對電壓(I-V)的量測 29
3-1-2. 光功率對電流(L-I)之量測 29
3-1-3. 遠場(Far field)之量測系統 30
3-1-4. 近場(Near field)投影之量測系統 30
3-1-5. 頻譜(Spectrum) 之量測系統 31
3-1-6. 頻寬(Bandwidth)之量測系統 31
3-1-7. 眼圖(Eye pattern)之量測系統 32
3-2水氧化掏離可靠度分析與量測 34
3-2-1. VCSEL元件結構圖 34
3-2-2. 電流對電壓（I-V）及輸出光功率對電流 (L-I)曲線 35
3-2-3. 光頻譜(Optical spectra)圖 37
3-2-4. 頻寬(Bandwidth) 38
3-2-5.可靠度測試(Life time) 39
3-3氧化孔徑(Oxide aperture)與頻率響應的量測 41
3-3-1.氧化孔徑與頻率響應關係 41
3-4共振腔(Cavity)改變及量子井加入應力(strain)驗證與量測 45
3-4-1.共振腔長度縮短及量子井加入應力(strain)原理 45
3-4-2.改變共振腔長度使用GaAs Quantum well元件量測比較 47
3-4-3.使用AlInGaAs Quantum well的元件量測 53
3-4-4.Benchmark 59
第四章結論與未來研究 60
Reference 61
附錄A 1
附錄B 2

圖目錄
圖 1-2-1.台灣4G通訊標誌[1] 2
圖 1-2-2.構成光纖通訊的主要元件[2] 2
圖 1-3-1.面射型和邊射型雷射 4
圖1-4-1.四種VCSEL電流侷限結構。(a)蝕刻空氣柱結構、(b)離子佈植式結構、(c)再成長淹埋異質結構、(d)氧化侷限式結構。[4] 6
圖1-5-1. VCSEL氧化層結構 (a)退化型VCSEL氧化層線缺陷往量子井方向TEM側面圖、(b)氧化畫層線缺陷TEM俯視圖。 7
圖1-5-2. VCSEL氧化層結構 (a)尖端氧化層、(b)多層氧化層、(c)氧化層離量子井數個DBR 7
圖1-5-3. VCSEL氧化層結構 (a)未氧化掏離的元件、(b)經過氧化掏離後的元件。 8
圖2-2-1.經過鋅擴散後的DBR反射率與鋅擴散深度關係[8-10] 13
圖2-2-2.於共振腔結構中產生的多模與放射單模雷射光束示意圖 13
圖2-2-4. (a)為設定溫度於650度時，擴散30分鐘的SEM。由圖可知， 15
鋅擴散下向深度約為2μm，橫向約為1μm。(b)擴散20分鐘。 15
圖2-3-1.氧化層模與共振腔模同時出現互相影響 18
圖2-5-1.共振頻率提升示意圖 19
圖2-5-2.單模及多模VCSEL資料傳輸之示意圖 20
圖2-5-3. (a)surface relief[26-27] (b) triangular holey [28] (c) Implant[29] 21
圖2-5-4.氧化孔徑與鋅擴散孔徑比較示意圖 21
圖2-5-5.SHB示意圖 22
圖2-5-6.國外實驗室所發表之單膜面射型雷射[35] 22
圖2-5-7.漸變水氧化層結構[31] 23
圖2-6-1 水氧化系統示意圖 24
圖2-7-1 IR系統示意圖 25
使用IR系統觀察850nm VCSEL氧化孔徑圖 26
圖2-8-1.遠場發散角的發散示意圖 26
圖3-1-1.I-V量測系統 29
圖3-1-2.L-I量測系統 30
圖3-1-3.遠場量測系統 30
圖3-1-4.近場投影量測系統 31
圖4-1-5. 頻譜量測系統 31
圖3-1-6. 頻寬量測系統 32
圖3-1-7. 眼圖量測系統 33
圖3-2-1.(a)VCSEL元件頗面結構圖(b)VCSEL元件俯視圖 34
圖3-2-2.(a)IR顯微鏡觀察氧化孔徑大小(b)將Al2O3掏離SEM結面圖 35
圖3-2-3.增益峰值與F-P峰值的移動[41] 36
圖3-2-4.Device A & B 有無水氧化層掏離(Relief)元件比較 37
圖3-2-5.(a)Device A 電流2、4、6、8mA相對光頻譜(optical spectra) 38
(b) Device B 電流2、4、6、8mA相對光頻譜(optical spectra) 38
38
圖3-2-6. (a)Device A 頻率響應圖, (b)Device B 頻率響應圖 38
圖3-2-7. (a)Device A 輸出功率衰減比例圖, (b)Device B 輸出功率衰減比例圖 41
圖3-3-1.元件C、D、E的L-I曲線 42
圖3-3-2.元件C、D、E的光頻譜(optical spectra) 42
圖3-3-3.元件C、D、E的頻率響應 43
圖3-4-1. InGaAs/GaAs E-K能帶似意圖[42] 45
圖3-4-2. (a)GRIN-SCH半導體雷射結構之電場分佈圖(b)SCH結構電場分佈圖 46
圖3-4-3. 元件I、F的L-I曲線 48
圖3-4-4 元件I、F的4mA、6mA、8mA、相對光頻譜(optical spectra) 48
圖3-4-5 元件I、F的頻率響應圖 48
圖4-4-6.SHB示意圖 50
圖3-4-7 元件C、G的L-I曲線 52
圖3-4-8 元件C、G的相對光頻譜(optical spectra) 53
圖3-4-9 元件C、G的頻率響應圖 53
圖3-4-10 元件H的L-I-V曲線 54
圖3-4-11 元件H的頻譜圖 55
圖3-4-12 (a)元件H在室溫上的頻響圖(b) 元件H在85℃上的頻響圖 55
圖3-4-13 元件H在3.5mA41Gbit/sec (BTB)傳輸 56
圖3-4-14 元件H在41Gbit/sec (BTB) 速率下BER分析圖 56
圖3-4-15 元件H在41Gbit/sec (100公尺) 速率下BER分析圖 57

表目錄
表2-1. IQE晶片之詳細資料 11
表3-2-1.鋅擴散深度與氧化孔徑比較表 34
表3-2-2.大訊號眼圖比較表 39
表3-2-3.燒測狀態圖表 40
表3-2-4.元件C、D、E條件表 41
表3-2-5.元件C、D、E 25Gbit/sec，及E的12.5Gbit/sec BTB眼圖 44
表3-4-1 元件I、F條件表 47
表3-4-2 元件C、G條件表 52
表3-4-3 元件H條件表 53
表3-4-4 元件H大訊號41Gbit/sec傳輸BTB及100公尺 56
表3-4-5 元件H在85℃ 41Gbit/sec (BTB)眼圖 58
表3-4-6 高速元件40Gbit/sec以上團隊比較[46] 59

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指導教授

許晉瑋(Jin-Wei Shi)

審核日期

2014-7-28

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