X 光 波 域 光 學 薄 膜 之 研 究

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姓名

鄭光珮(Kung-Pei Cheng) 查詢紙本館藏

畢業系所

光電科學與工程學系

論文名稱

X 光波域光學薄膜之研究
(The Research of Optical Thin Filmin the X-Ray Region)

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摘要(中)

本論文研究軟X光區域的多層膜高反射鏡及使用銅靶輻射量測X光反射率，檢測多層膜結構。
關於13.6nm的近垂直入射多層膜高反射鏡，可優化出高反射率的膜層結構。經優化53層鉬矽多層膜，鉬和矽的膜層厚度分別為3.03nm和4.07nm，對S偏振光而言，四分之一波膜堆的理想反射率為69.42%，我們優化後週期性膜堆的理想反射率為72.12%。對p偏振光而言，四分之一波膜堆的理想反射率為65.97%，我們優化後週期性膜堆的理想反射率為69.36%。
由於近垂直入射多層膜高反射鏡對膜厚及粗糙度的要求甚高，因此使用離子束濺鍍法製鍍出非晶態薄膜，藉著銅靶輻射以掠角入射薄膜，根據Kiessig干涉條紋精準的求得薄膜的特性，包括薄膜密度、消光係數、厚度及各界面粗糙度。求得的結果與原子力顯微鏡比較，並非完全吻合。主要的原因為X光量測的範圍較大，因此提供的訊息是平均值，且包含高頻波。而原子力顯微鏡量測的範圍是局部性，且濾掉高頻波。

摘要(英)

The paper is discussed about designing the nearly normal incident multilayer mirrors in the X-Ray region and analyzing the multilayer based on measuring X-Ray reflectivity .
For the nearly normal incident multilayer mirrors at 13.6 nm , our program can optimize the structure of the high–reflectivity mirrors . After optimizing the 53 layers Mo/Si mirrors , we can find out that the thickness of the Mo and Si thin film are 3.03nm and 4.07nm . For s-pol. , the reflectivity of the quarter wave stick is 69.42% , and the reflectivity of our design is 72.12% . For p-pol. , the reflectivity of the quarter wave stick is 65.97% , and the reflectivity of our design is 69.36% .
It is important for the thickness mistakes and roughness of nearly normal incident multialyer mirrors . We manufacture the amorphous thin film by using ion beam sputtering deposition , and obtain the characteristics of the multilayers by measuring the X-Ray reflectivity of radiation of Cu target , for example the mass density , extinction coefficient , thickness of the thin film and the roughness of the interface . Generally speaking , the roughnesses by fitting X-Ray reflectivity are different from the roughnesses of using AFM . This result is that the area by X-Ray illuminated is larger than by AFM measuring , and X-Ray reflectivity contains the data of high frequency waves.

關鍵字(中)

★ X 光
★ 光學薄膜
★ 粗糙度

關鍵字(英)

★ Optical Thin Film
★ X-ray

論文目次

目錄
致謝辭 I
中文摘要 II
英文摘要 III
目錄 IV
圖目錄 VI
表目錄 IX
符號表 X
第一章前言 1
1-1 X光發現及其特性 1
1-2 研究動機 4
1-3 文獻回顧 7
1-4 論文概要 9
第二章理論 10
2-1 折射率 10
2-2 X光反射率 15
2-2-1 一個平整介面的X光反射率 15
2-2-2 多個界面的X光反射率 17
2-3 多層膜高反射鏡之理論 19
2-3-1 適當波長及適當材料的選擇 19
2-3-2 優化膜層厚度 26
2-4 簡形優化法 30
第三章實驗儀器 33
3-1 掠角入射X光反射率分析多層膜結構 33
3-1-1 實驗裝置 33
3-1-2 實驗校準 34
3-2 離子束濺鍍(Ion Beam Sputtering Deposition) 36
3-2-1 離子束濺鍍鍍膜系統架構 37
3-3 原子力顯微鏡 39
第四章實驗與模擬結果 40
4-1 軟X光多層膜高反射鏡的光譜圖模擬 40
4-2 X光反射率解析多層膜結構 44
4-2-1 模擬結果 44
4-2-2 實驗結果 53
第五章結論 68
第六章參考文獻 69

參考文獻

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指導教授

李正中(Cheng-Chung Lee)

審核日期

2002-7-1

推文