摘要(英) |
Two dimensional electric field sensors
Abstract
This research is introduced by two dimension electrical sensors for measuring flatness of semiconductor wafer, using high sensitive and more precision capability of this equipment for measurement. The principle of this research makes use of same level of electrical field within wafer, when wafer surface are different height and it means have variation within wafer. The sensor can detect them by different delta voltage and transfer to height. In other word, it means from voltage domain to distance domain. Then we can use height of every point to calculate flatness (GBIR) of wafer.
This research is introduced by two dimension electrical sensors for measuring flatness of semiconductor wafer, its major device is included by a buffer, add and subtraction unit, amplifier, high p filter and low p filter, this device is used to detect delta voltage in X and Y direction, then also transfer to delta height in X and Y direction, then we can get flatness of wafer.
Except this, we also can use this equipment to measure flatness of TFT-LCD glass plate. |
參考文獻 |
參考文獻
1. 堺孝夫編,黃忠良譯著,“放電現象應用”,復漢出版社,民國75年。
2. 歐福源 劉良俊,“運算放大器手冊”,全華科技圖書股份有限公司,民國80年。
3. 高海演編譯,“放大器電路設計指南”,全華科技圖書股份有限公司,民國82年。
4. Richard C. Jaeger著,呂學士、管傑雄、劉致為譯,“微電子電路設計“,東華書局股份有限公司,民國87年。
5. 陳宏亮,“Rosen型壓電變壓器降壓特性之研究”碩士論文,國立成功大學電機系,民國89年。
6. B. E. Noltingk, “A novel proximity gauge,” J. Sci. Instrum., vol. 2, no.2,1969, pp. 356-360.
7. B. E. Noltingk, A. E. T. Nye, and H. J. Turner, “Theory and application of a proximity gauge using fringing capacitance,” in Proc. ACTAIMEKO, 1976, pp. 537-549.
8. 王世銘,”邊際電容感測器應用於微小距離之量測”,國立雲林科技大學,電子工程系,實務專題報告,2002.
9. 嚴碩桓,“ 次微米邊際電容感測器之研製”,國立雲林科技大學,機械工程研究所,碩士論文, 2002.
10. 黃俊明,“ 奈米級邊際電容感測器之驗證”,國立雲林科技大學,機械工程研究所,碩士論文, 2003.
11. 黃大猷,”晶圓表面狀態之奈米量測”, 國立雲林科技大學,機械工程研究所,碩士論文 , 2000.
12. Ren C. Luo and Zhenhai Chen, 1993, “Modeling and implementation of innovative micro proximity sensor using micromachining technology”, IEEE/RSJ International Conference on Intelligent Robots and Systems, Yokohama, Japan, pp. 1709-1716.
13. Book of SEMI Standard 0698 “GLOBAL 300mm STANDARDS VOLUME”, SEMI 1997~1998.
14. Ernest O.Doebelin “Measurement Systems Application and Design” Fourth Edition, McGRAW-HILL,1990.
15. 張家仁, ”邊際電容微感測器的分析與最佳化設計”, 國立雲林科技大學, 機械工程研究所,碩士論文, 2001.
16. Zhenhai Chen and Ren C. Luo,” Design and implementation of capacitive proximity sensor using microelectromechanical systems technology”, IEEE Transactions on Industrial Electronics, vol.45, no.6, ,1998 ,pp. 886-894.
17. Joost C. Lotters, Wouter Olthuis, Peter H. Veltink, and Piet Bergveld,” A sensitive differential capacitance to voltage converter for sensor applications .”, IEEE Transactions on Instrumentation and Measurement, val.48, no.1, February 1999.
18. H. U. Meyer, “An integrated capacitive position sensor” , IEEE Trans. Instrument Meas. Vol. 45,pp.521-525,April 1996.
19. D.M.G. Preethichandra and K. Shida, A simple interface circuit to measure
20. 國立雲林科技大學機械工程系碩士班碩士論文,陣列式晶圓感測系統研發, 研究生:陳勇叡,指導教授:汪島軍,2004 |