整合填充型水洗技術於潔淨室外氣空調箱 以去除酸鹼氣態分子污染物之研究

以作者查詢圖書館館藏

、以作者查詢臺灣博碩士

、以作者查詢全國書目

、勘誤回報

、線上人數：17

、訪客IP：3.145.82.50

姓名

徐文瑞(Wen-Jui Hsu) 查詢紙本館藏

畢業系所

環境工程研究所在職專班

論文名稱

整合填充型水洗技術於潔淨室外氣空調箱以去除酸鹼氣態分子污染物之研究
(Application of Air washer of Make-up Air Units to Remove Acidic and Basic Gaseous Melecular Pollutants)

相關論文

★ 熱昇華廢棄相紙資源化研究	★ 地勤公司從業人員搬運作業肌肉骨骼傷害風險評估
★ 高階製程安全管理架構	★ In Situ Measurements of CCN Activity and Aerosol Optical Properties at Biomass Burning Source and Receptor Regions
★ 以COMSOL Multiphysics模擬氣懸微粒於靜電集塵式細胞株暴露系統中之運動軌跡	★ 社區改造碳排放及減量計算分析與探討
★ 中小型燃煤鍋爐粒狀污染物、硫氧化物及氮氧化物經串聯控制設備後之去除效率探討研究-以桃園市為例	★ 固定污染源揮發性有機物(VOCs)自廠係數建置-以某矽晶圓製造廠為例
★ 高層建築大樓室內空氣品質之探討-以某企業大樓為例	★ 公路交通運輸對於山谷地形郊區空氣品質之影響
★ 以沸石轉輪焚化系統處理變壓器塗裝作業VOCs效率探討	★ 以數值模擬分析狹縫型虛擬衝擊器之效能
★ 研究微粒帶電性質與呼吸毒性之關聯: 以小鼠暴露奈米黑碳微粒實驗為例	★ 靜電集塵式ALI暴露系統之設計、開發與評估
★ 以石英晶體微天平量測細懸浮微粒PM2.5質量濃度之可行性探討	★ 以HTDMA與HT DMA-APM系統探討無機鹽奈米微粒的吸溼行為

檔案

[Endnote RIS 格式]

[Bibtex 格式]

[相關文章]

[文章引用]

[完整記錄]

[館藏目錄]

[檢視]

[下載]

本電子論文使用權限為同意立即開放。
已達開放權限電子全文僅授權使用者為學術研究之目的，進行個人非營利性質之檢索、閱讀、列印。
請遵守中華民國著作權法之相關規定，切勿任意重製、散佈、改作、轉貼、播送，以免觸法。

摘要(中)

摘要(中)
在高科技生產廠房，由於製程的進步及晶圓製程線徑的微小化，對於生產環境的需求已從要求粒狀污染物進而要求氣態分子污染物(Airborne Molecular Contaminant, AMC)的濃度標準。對潔淨室外氣空調箱(Make-up Air Unit, MAU)利用空氣洗滌器(Air Washer)加濕方式，同時去除大氣中的氣態分子污染物中二氧化硫(SO2)、氨(NH3)，藉由水對於二氧化硫、氨等氣體為良好的溶劑，進而提升此類污染物的去除效率。目前應用在加濕上使用的空氣洗滌器(Air Washer)大都採用噴淋水洗的方式，將其搭配填充型洗滌塔，便可將加濕器有效運用於去除AMC，所以填充型洗滌塔的填充材料型式，便為影響去除效率的一項重要參數。
本研究探討洗滌塔的填充材料分別為立體結構型填充物及SUS304交叉絲網，其於不同的水質條件下，對二氧化硫(SO2)及氨(NH3)的去除效率，實驗發現：SUS304交叉絲網循環水水質控制在30 μS/cm時對於二氧化硫及氨的最高去除效率分別為68%及93%，出口濃度可維持在2 μg/m3以下。將循環水水質控制在10 μS/cm時，對於二氧化硫及氨的最高去除效率可分別提昇至79%及97%。當填充材料為立體結構型填充材料時，其填充層厚度為SUS304交叉絲網的三分之一，即可達到與SUS304交叉絲網相同的去除效率，所以使用立體結構型填充材料，可縮短空氣洗滌器(Air Washer)的建置空間，進而增加生產機台的設置，有效提升企業的的競爭力及獲利。

摘要(英)

摘要(英)
Airborne molecular contamination (AMC) is chemical contamination in the form of vapors or aerosols, that and has a detrimental effect on a product or a process. The main sources of AMC in cleanrooms are the ambient environments, process chemicals, emissions from tools emissions, and construction materials. With the increased production of semiconductor devices in the sub-100 nm range, a Abating AMC has become a crucial element of cleanroom management as the production phase of semiconductor devices marches deep into sub-100-nm range. Make-up air units (MAUs) are air- handling units that provide purified outside air to cleanrooms. An The air washer of in an MAU is a piece of equipment that is designed to remove contamination by scrubbing the outside air that moves through it. Internal packing in the packed a tower of air washers provides a large wetted contact surface area to induce intimate contact between for the contaminated gas and the scrubbing liquid.
This study evaluated the removal performance of SO2 and NH3 by in a tower of packing of air washers with that used SUS304 wire netting and structured-interlaced monofilament as internal packing material. It is found The results showed that one third a tower packeding with depth of structured- interlaced monofilament can achieve the same removal performance as a tower packed with SUS304 wire netting, but at one-third the packing depth. This is due to because the packing material of used in the structured-interlaced monofilament could facilitated the breakup of the liquid phase and created the maximum surface area for mass transfer with in the vapor phase. Using structured-interlaced monofilament packing material, would considerably reduce the volume of the air washer could be reduced largely, and thereby actuvate increasing the working space of the factory.

關鍵字(中)

★ 氣態分子污染物
★ 外氣空調箱
★ 空氣洗滌器
★ 洗滌塔填充材

關鍵字(英)

★ AMC
★ MAU
★ Air Washer
★ packing material

論文目次

目錄
第一章前言 ............................................1
1.1 研究緣起 ............................................1
1.2 研究目的 ............................................3
第二章文獻回顧 .........................................5
2.1 氣態分子污染物介紹 ..................................5
2.2 潔淨室氣態分子污染物對製程的影響 ......................6
2.2.1 製程環境對氣態分子污染物的控制要求 ..................7
2.2.2 國內潔淨室環境常見酸鹼污染氣體 ......................9
2.2.3 外氣空調箱酸鹼氣態分子污染物來源探討 ...............10
2.3 Air Washer 去除 AMC 的相關技術探討 .................11
2.3.1 液氣比與水霧粒徑對去除效率的探討 ..................14
2.3.2 吸收液水質對於去除效率的影響 ......................15
2.4 SO2 及 NH3 的物理化學特性與吸收理論 .................16
2.4.1 吸收原理 .........................................16
2.4.2 質傳與溶解度 .....................................17
2.4.3 填充式洗滌塔 .....................................19
第三章研究方法 ........................................24
3.1 研究流程 ...........................................24
3.2 實廠外氣空調箱 Air Washer 設計及操作條件 ............26
3.2.1 外氣空調箱 Air Washer 的操作條件及說明 ............27
3.2.2 循環水使用水質要求 ...............................27

3.2.3 填充材料的型式 ...................................29
3.2.4 使用噴嘴型式及條件 ...............................30
3.3 採樣分析的方法 .....................................32
3.3.1 採樣流程與分析實驗室處理程序 ......................32
3.3.2 採樣器具及分析儀器概述 ............................33
3.4 Kya(氣相總質傳係數)值計算 ..........................37
第四章結果與討論 ......................................38
4.1 洗滌循環水水質與去除效率的探討 ......................38
4.2 污染物濃度對去除效率的影響 ..........................40
4.3 不同填充材料的去除效率探討 ..........................41
4.4 不同操作條件及填充材料的氣相總質傳係數(Kya)值比較 .....42
4.5 SO2 處理效率提升與填充高度關係探討 ...................46
第五章結論與建議 ......................................49
5.1 結論 ..............................................49
5.2 建議 ..............................................50
參考文獻 ..............................................51 附錄一 ................................................54 附錄二 ................................................62
附註一採樣分析流程圖 .............................69
附註二所參考分析方法之主要數據 ....................70
附註三 ...........................................71
附錄三 ................................................72

參考文獻

參考文獻
1.林義凱，“潔淨室無機污染物採樣及晶圓表面吸附沈積行為探討”，國立交通大學，博士論文，民國99年。
2.SEMI F21-95,“Classification of Airborne Molecular Contaminant Levels in Clean Environments.” Semiconductor Equipment and Materials International, Mountanin View, CA,1995.
3.SEMI F21-1102, “Classification of Airborne Molecular Contaminant Levels in Clean Environments.” Semiconductor Equipment and Materials International, Mountanin View, CA,2002.
4.Lue, S.J., Wu, T., Hsu, H. and Huang, C. “Application of Ion Chromatography to the Semiconductor Industry. I. Measurement of Acidic Airborne Contaminants in Cleanroom. J. Chromatography A, 801(1-2), pp. 273-278，1998
5.Lue, S.J. and Huang, C. Application of Ion Chromatography to the Semiconductor Industry. II. Measurement of Basic Airborne Contaminants in Cleanroom. J. Chromatography A, 850(1-2), pp. 283-287 ,1999
6.曾麗玲，“無塵室空氣酸鹼污染物的分析及其對元件缺陷影響之研究” ，元智大學，碩士論文，民國96年。
7.International Technology Roadmap Semiconductor 2006 Update.
8.H. Matsui et al.,”Airborne Contamination Control in 157nm Lithography”,4th International Symposium on 157nm Lithography , August 2003.
9.謝瑞豪，高科技產業潔淨室環境之需求，潔淨科技。12，17-29頁，2005。
10.K. Ijima et al.” Removal of chemical Compounds from outside air by air washer ”，15th Annual Tech. Meeting On Air Cleaning and Contamination Control，1997.
11.T. Watanabe et al. “The influence of the cooling dehumidifier after the air washer on the removal efficiency”，16th Annual Tech. Meeting On Air Cleaning and Contamination Control，1998.
12.S. Yoshizaki et al. “Removal of chemical from outside air by air washer”, 17th Annual Tech. Meeting On Air Cleaning and Contamination Control，1999.
13.T. Imai et al. “Study on removal efficiency of chemical componds in air by air washer and vapor condensation” 17th Annual Tech. Meeting On Air Cleaning and Contamination Control，1999.
14.H. Okada et al. “Removal of gaseous organic compounds and ionic matter in air by wet type air cleaner(Part3)” 19th Annual Tech. Meeting On Air Cleaning and Contamination Control，2001.
15.張義龍，“潔淨室外氣空調箱水洗加濕器對系統加濕及氣體污染物去除效率之技術探討”，國立台北科技大學，碩士論文，民國95年。
16.趙世閔，”潔淨室外氣空調箱空氣水洗機去除無機酸鹼氣體汙染物”，國立台北科技大學，碩士論文，民國97年。
17.何俊河，”空氣水洗機去除氨氣之效率分析”，國立勤益科技大學，碩士論文，民國99年。
18.H. Wakamatsu et al. “High Efficiency Airborne Molecular Contanminants Removal Technology by A New Cooled-Type 2-Stage High-Speed Air Washer Method ”，The Ninth International Symposium on Semiconductor Manufacturing ,pp.289-292，2000.
19.M. Inoue et al. “Characteristics of wet-air Clean System ”， 18th Annual Tech. Meeting On Air Cleaning and Contamination Control，54-57，2000.
20.S.T. Park et al. “An Experiment on Performance Evaluation of Particle Collection and Gas Removal of An Air Washer System for Semiconductor Manufacturing Clean Rooms”，European Aerosol Conference，2007，Salzburg.
21.H. Inaba et al. ” Effectiveness of hydrophilic eliminator installed on air-washer”,18th Annual Tech. Meeting On Air Cleaning and Contamination Control, pp. 51-53,2000.
22.C.H. Huang,” Theoretical Model of Absorption of Ammonia by Fine Water Spray”, Environmental Engineering Science, Vol22, Iss. 4, 2005.
23.K. Ijima et al.” Removal of chemical Compounds from outside air by air washer (part2) ，The unfluence of the quality of water on removal efficiency” 16th Annual Tech. Meeting On Air Cleaning and Contamination Control，1998.
24.H. Wakamatsu et al. “New Chemical Removing and Air Cooling Technology for Clean Room Recirculation Air using Chilled Pure Water Showering Method ” ，Semiconductor Manufacturing Symposium，IEEE International,pp.485-488，2001.
25.呂維明等，化工單元操作(三)質傳分離操作，初版，高立圖書，新北市，民國一百零一年。
26.賈紹義等，化工質傳與分離過程，化學工業出版社，北京、2001。
27.蔡俊鴻，氣狀污染物控制設備之評估與選用，經濟部工業局編印，民國八十六年。
28.林俊維，“洗滌塔添加Na2SO3對NO2去除效率之影響研究”，淡江大學水資源及環境工程學系，碩士論文，民國89年。

指導教授

蕭大智(Ta-Chih hsiao)

審核日期

2017-7-20

推文