參考文獻 |
[1] L. T. Canham, "Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers", Appl. Phys., Lett. 57, pp.1046, 1990.
[2] D. Dimova-Malinnovska, M. Sendova-Vassileva, "Preparation of thin porous silicon layers by stain etching", Thin Solid Films, pp.297, 1997.
[3] X. Li, P. W. Bohn, "Metal-assisted chemical etching in HF/H2O2 produces porous silicon′′, Applied Physics Letters, Vol.77, pp2572-2574, 2000.
[4] J. L. Tian, H. Y. Zhang,′′Controllable growth od silicon nanowire arrays fabricated by two-step siliver catalyzed chemical etching′′, Superlattices and Microstructures, Vol.88, pp.180-187, 2015.
[5] Yousong Liu, Guangbin Ji, Junyi Wang, Xuanqi Liang, Zewen Zuo, Yi Shi,′′Fabrication and photocatalytic properties of silicon nanowires by metal-assisted chemical etching: effect of H2O2 concentration′′, Nanoscale Research Letters, Vol.7, pp.663, 2012.
[6] W. Barthlott and C. Neinhuis, ′′Purity of the Sacred Lotus, or Escape from Contamination in Biological Surfaces′′, Planta, Vol. 202, pp. 1-8, 1997.
[7] C. Sun, X. W. Zhao, Y. H. Han, Z. Z. Gu, ′′Control of water droplet motion by alteration of roughness gradient on silicon wafer by laser surface treatment", Thin
Solid Films 516, pp. 4059-4063, 2008.
[8] W. Zhang, X. Fan, S. Sang, P. Li, G. Li, Y. Sun, and J. Hu, ′′Fabrication and characterization of silicon nanostructures based on metal-assisted chemical etching′′, Korean J. Chem. Eng., Vol.31, pp.62-67, 2013.
[9] M. Y. Chen, Z. H. Jia, T. Zhang, Y. Y. Fei, ′′Self-propulsion of Leidenfrost droplets on micropillared hot surfaces with gradient wettability′′, Applied Surface Science, Vol.433, pp.336-340, 2018.
[10] M. P. Pileni, Barry W. Ninham, T. Gulik-Krzywicki, J. Tanori, I. Lisiecki, A.Filankembo, ′′Direct relationship between shape and size of template and synthesis of copper mental particles′′, Adv. Mater, Vol.16, pp.1358-1362, 1999.
[11] Mark C. Draper , Colin R. Crick, Viktorija Orlickaite , ′′Superhydrophobic surfaces as an on-chip microfluidic toolkit for total droplet control′′, Anal. Chem., Vol.85, pp.5405–5410, 2013.
[12] L. C. Chen, S. W. Chang, C. S. Chang, "Catalyst-free and controllable growth of SiCxNy nanorods", J Phys. & Chem. Solids, Vol.62, pp.1567–1576, 2001.
[13] Y. Wu, Y. Cui, L. Huynh, C. J. Barrelet, D. C. Bell, and C. M. Lieber, "Controlled Growth Structures of Molecular-Scale Silicon Nanowires", Nano Lett., Vol.4, pp.443-436, 2004.
[14] N. Wang, Y. F. Zhang, Y. H. Tang, C.S. Lee, S. T. Lee, "Oxide-assisted growth and optical characterization of gallium-arsenide nanowire", Appl. Phys. Lett., Vol.78, pp. 3304, 2001.
[15] W. B. Choi, D. S. Chung, J. H. Kang, H. Y. Kim, Y. W. Jin, I. T. Han, Y. H. Lee, J. E. Jung, N. S. Lee, G. S. Park, J. M. Kim, “Fully sealed, high-brightness carbon-nanotube field-emission display”, Appl. Phys. Lett., Vol.75, no.20, pp.3129-3131, 1999.
[16] Stephen Y. Chou, Chris Keimel, Jian Gu, “Ultrafast and direct imprint of nanostructures in silicon”, Nature, Vol.417, pp.835-837, 2002.
[17] T. Young, "An Essay on the Cohesion of Fluids", Philosophical Transactions of the Royal Society, Vol.95, pp.65-87, 1805.
[18] R. N. Wenzel, "Resistance of solid surfaces to wetting by water", Ind. Eng. Chem.,
Vol.28, pp.988-994, 1936.
[19] A.B.D.Cassie, S.Baxter, "Wettability of porous surface", Transactions Faraday Society, Vol.40, pp.546-551, 1944.
[20] M. Lajvardi, H. Eshghi, "Structural and optical properties of silicon nanowires synthesized by Ag assisted chemical etching", Materials Science in Semiconductor Processing, Vol.40, pp.556-563, 2015.
[21] Z. Huang, N. Geyer, P. Werner, J. de Boor, U. Gösele , "Metal-assisted chemical
etching of silicon", Adv. Mater., Vol.23, pp.285–308, 2011.
[22] H. Omar, M. J. Salifairus, S. A. H. Alrokayan, H. A. Khan, A. M. M. Jani, M. R. Mahmood, S. Abdullah, "Effect of temperature to the structure of silicon nanowires growth by metal-assisted chemical etching", 2015 IEEE Student Conference on Research and Development, SCOReD 2015, pp. 649-652, 2016. |