可撓曲銀/矽單晶奈米孔洞通道陣列之製備及其近紅外光感測特性之研究

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徐瑋(WEI HSU) 查詢紙本館藏

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化學工程與材料工程學系

論文名稱

可撓曲銀/矽單晶奈米孔洞通道陣列之製備及其近紅外光感測特性之研究

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摘要(中)

本實驗結合貴金屬催化蝕刻法及鹼性蝕刻法，在低成本的條件下，快速製備出超薄型可撓曲式矽晶元件，除此之外，更進一步的利用自組裝奈米球微影術結合光輔助電化學蝕刻法製備出大面積且尺寸可調控之矽單晶奈米孔洞通道結構陣列，此結構顯示出於可見光波段具有高的光吸收能力，並額外再透過無電鍍沉積法成功還原銀奈米金屬顆粒於奈米結構內部以及表面，使其可產生表面電漿共振之效應，以拓展光吸收之範圍至近紅外光波段。在元件的製程中，本實驗首先於較厚之矽晶基材上開發出具良好光感測性能之元件，電極的製備使用高真空濺鍍系統於試片背面鍍製鋁金屬薄膜作為歐姆接觸之電極，而正面電極則依靠無電鍍沉積法所還原之銀奈米顆粒做為蕭基接觸之電極。以940 nm近紅外光照射銀/矽蕭基接面結構光感測器並量測其光響應度、靈敏度及響應時間，最後再將具有最優異性質之元件製備條件直接與可撓曲矽單晶基材整合。

摘要(英)

This experiment combines the noble metal catalytic etching method and the alkaline etching method to quickly fabricate ultra-thin flexible silicon crystal components under low-cost conditions. In addition, further use of self-assembled nanosphere lithography combined with photo-assisted electrochemical etching, a large-area and adjustable-size silicon single-crystal nano-hole channel structure array is prepared. This structure shows that it has high light absorption capacity in the visible light band, and is additionally successfully deposited by electroless deposition. Reduce the silver nano metal particles inside and on the surface of the nano structure, so that it can produce the effect of surface plasmon resonance to expand the range of light absorption to the near-infrared light band. In the manufacturing process of the device, this experiment first developed a device with good light sensing performance on a thicker silicon crystal substrate. The preparation of the electrode used a high vacuum sputtering system to deposit an aluminum metal film on the back of the test piece as the ohmic contact. The electrode, and the front electrode relies on the silver nano particles reduced by the electroless deposition method as the electrode of the Schottky contact. The silver/silicon Schottky junction structure light sensor was irradiated with 940 nm near-infrared light and its light responsivity, sensitivity and response time were measured. Finally, the preparation conditions of the most excellent device were directly matched with the flexible silicon unit. Crystal substrate integration.

關鍵字(中)

★ 矽基近紅外光感測元件
★ 蕭基光感測元件
★ 矽單晶奈米孔洞通道陣列
★ 無電鍍沉積銀奈米顆粒
★ 可撓曲光感測元件
★ 矽晶基材薄化製程

關鍵字(英)

論文目次

第一章前言及文獻回顧 1
1-1 前言 1
1-2 一維矽單晶奈米結構 3
1-2-1 一維矽單晶奈米結構之應用 3
1-2-2 一維矽單晶奈米孔洞通道之製備 4
1-3 超薄型可撓曲式矽晶感測元件 6
1-3-1 超薄型可撓曲式元件之應用 6
1-3-2 超薄型可撓曲式矽單晶基材之薄化製程 7
1-4 金屬奈米材料之特性 9
1-5 光感測元件 11
1-5-1 半導體與金屬接觸理論及蕭基接面之光感測機制 11
1-5-2 紅外線光感測器 13
1-6 研究動機及目標 15
第二章實驗步驟及儀器設備 17
2-1 規則有序且準直排列之尺寸可調控矽單晶奈米孔洞通道陣列結構 17
2-1-1 自組裝奈米球模板陣列製備 17
2-1-2 鹼性溶液蝕刻法調控矽單晶奈米倒金字塔陣列尺寸 18
2-1-3 光輔助電化學蝕刻法製備矽單晶奈米孔洞通道 18
2-2 無電鍍沉積金屬銀奈米顆粒 19
2-3 超薄型可撓曲式矽單晶元件製備 19
2-3-1 矽晶基材使用前處理 19
2-3-2 貴金屬催化蝕刻法快速薄化矽單晶基材至可撓曲厚度 20
2-3-3 鹼性蝕刻法修飾矽單晶基材表面粗糙度 20
2-4 濺鍍金屬鋁薄膜 21
2-5 製備光感測元件 21
2-6 試片分析 21
2-6-1 掃描式電子顯微鏡 21
2-6-2 可見光-近紅外光譜儀 22
2-6-3 近紅外光偵測系統 23
2-6-4 影像式水滴接觸角量測儀 23
第三章結果與討論 25
3-1 矽單晶奈米孔洞通道結構陣列 25
3-1-1 單層自組裝奈米球模板陣列製備 25
3-1-2 奈米球微影術結合濕式化學蝕刻法製備矽單晶奈米倒金字塔陣列 27
3-1-3 光輔助電化學蝕刻法製備矽單晶奈米孔洞通道陣列 28
3-1-4 可見近紅外光積分球光譜儀分析 36
3-1-5 水滴接觸角量測分析 39
3-2 銀/矽單晶奈米孔洞通道結構 40
3-2-1 無電鍍沉積金屬銀奈米顆粒 40
3-2-2 可見光-近紅外光積分球光譜儀分析 42
3-3 近紅外光偵測元件 45
3-3-1 銀/矽單晶奈米孔洞通道結構之蕭基接面製備 45
3-3-2 銀/矽單晶奈米孔洞通道蕭基接面結構之近紅外光光感測特性與探討 47
3-3-3 光感測元件之靈敏度、響應度以及響應時間 50
3-4 可撓曲銀/矽單晶奈米孔洞通道結構陣列 52
3-4-1 超薄型可撓曲式矽單晶基材製備 52
3-4-2 可見光-近紅外光積分球光譜儀分析 54
3-4-3 可撓曲式光感測元件之靈敏度、響應度以及響應時間 56
第四章結論與未來展望 58
參考文獻 60
表目錄 69
圖目錄 71

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指導教授

鄭紹良

審核日期

2021-10-29

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