摘要(英) |
With the advent of the era of Internet of Things and high-frequency communication and under the trend of explosive growth of data volume, both high-frequency devices and circuit boards are required to match the requirement of high-frequency transmission. Glass has excellent insulating properties. Compared with polymer materials and silicon substrates, it has better dielectric properties, which can reduce the dielectric loss during transmission and has high flexibility in size scaling compared to silicon. Therefore, Glass Printed Circuit Boards ( G-PCB ) attracted more attention. However, due to the excellent physical and chemical stability of glass, it is difficult to manufacture conductive metals on glass substrates, and sufficient adhesion between metal and glass substrates is a serious challenge. This study combines both techniques of laser patterning and electroless copper plating to fabricate copper wires with high adhesion on glass substrates. In this study, aluminosilicate glass substrate was used to form circuit pattern grooves in glass by the ultrafast laser induced ablation first, then the glass was immersed in electroless plating solution to deposit copper electrodes to obtain a patterned glass circuit board. The appropriate laser processing parameter sets were experimentally obtained as: the pulse overlap rate (Pulse Overlapping, PO) was 97.5%, the scanning overlap rate (Scanning Overlapping, SO) was 75%, and the energy density was 3.37, 2.21 or 1.69 J/cm2, respectively. Results show that better electrical properties can be obtained with higher energy density, and various aluminosilicate glasses have different copper deposition morphologies and electrical properties due to their intrinsic differences in compositions. This study analyzes the interface bonding mechanism based on the microscopic images on the glass-copper interface. According to TEM images and comparing that with the results in the literature, it is found that the glass laser-ablated surface was infiltrated by the electroless plating solution, so that the aluminum ions in the glass were replaced by copper ions. It was also found that copper elements exist inside the glass along the laser-ablated surface. TEM diffraction pattern further displayed that a polycrystalline phase was formed. The fact that copper presented at the interface not only served as a seed crystal for electroless deposition, but also acted as a mechanical anchor. As a result, the adhesiveness of electroless copper deposition and glass was favorable. The thermal cycle test was also performed to further examine the copper adhesion. After several back-and-forth cycles between high and low temperatures, the electroless copper still showed good electrical conductivity and effective adhesion to the glass substrate. Compared with the traditional electroless copper plating process that the steps such as sensitization and activation must be performed on the glass to form the seed pattern in advance, this study can effectively simplify the process and produce micron-scale copper wires. |
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