利用液滴進行選擇性區域無電沉積及金屬輔助化學蝕刻之研究

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姓名

沈秉勤(SHEN, PING-CHIN) 查詢紙本館藏

畢業系所

機械工程學系

論文名稱

利用液滴進行選擇性區域無電沉積及金屬輔助化學蝕刻之研究
(Research of Selective Regional Electroless Deposition and Metal-Assisted Chemical Etching Using Droplet Method)

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至系統瀏覽論文 (2028-12-20以後開放)

摘要(中)

多孔矽（Porous Silicon）由於其高比表面積和生物相容性，廣泛應用於奈米科技領域的材料。然而，其製造過程存在成本高昂、區域控制難度高、效率低下等問題。本實驗以金屬輔助化學蝕刻這個多孔矽製造中成本相對低廉的製造方法為著眼點，並以無電沉積這個金屬沉積方式進行改良，融合了無電沉積和液滴沉積技術，以實現簡單且迅速的區域沉積，同時降低了製程成本。深入研究影響液滴無電沉積的各種參數之間的關聯性，這有助於優化製程，找出適合不同情況下使用的參數。再將液滴沉積技術擴展到金屬輔助化學蝕刻製程，以實現更加簡便和高效的區域蝕刻，提高製程的靈活性。最重要的是，我們以此尋求創造多孔矽的圖案化可能性，希望面向更廣泛的應用領域。

摘要(英)

Porous Silicon is widely used as a material in the field of nanotechnology due to its high specific surface area and biocompatibility. However, the manufacturing process of porous silicon is characterized by high cost, difficult area control, and low efficiency. In this experiment, we focused on metal-assisted chemical etching, a relatively low-cost method for porous silicon fabrication, and enhanced electroless deposition, a metal deposition method, by combining electroless deposition and droplet deposition to realize simple and fast regional deposition while reducing the cost of the process. An in-depth study of the correlation between the various parameters affecting droplet electroless deposition helps to optimize the process and find the right parameters for different situations. We then extend the droplet deposition process to metal-assisted chemical etching processes to enable easier and more efficient area etching and to increase process flexibility. Most importantly, we are looking for the possibility of creating patterned porous silicon for a wider range of applications.

關鍵字(中)

★ 無電沉積
★ 金屬輔助化學蝕刻
★ 液滴沉積
★ 多孔矽

關鍵字(英)

★ electroless deposition
★ metal-assisted chemical etching
★ droplet deposition
★ porous silicon

論文目次

摘要 I
Abstract II
致謝 III
目錄 IV
圖目錄 VI
表目錄 VIII
第一章前言 1
1-1 多孔矽 1
1-2 金屬輔助化學蝕刻 2
1-3 無電沉積 5
1-4 圖型化製作 7
1-5 研究動機 8
第二章實驗內容 9
2-1 實驗材料與設備 9
2-1-1 實驗材料與化學品 9
2-1-2 實驗設備 9
2-2 實驗方法 10
2-2-1 多孔矽製備 10
2-2-2 接觸角量測 13
2-2-3 表面形貌量測 13
第三章問題與討論 14
3-1 液滴無電沉積 14
3-1-1 金屬離子濃度對液滴沉積之影響 16
3-1-2 氫氟酸濃度對液滴沉積之影響 26
3-1-3 溫度對液滴沉積之影響 31
3-1-4 沉積時間對液滴沉積之影響 38
3-1-5 液滴量與金屬沉積面積大小之關係 42
3-2 液滴金屬輔助化學蝕刻 44
3-3 圖型化沉積蝕刻 48
第四章結論 52
參考文獻 56

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指導教授

曹嘉文(Tsao, Chia-Wen)

審核日期

2023-12-22

推文