摘要(英) |
This thesis employs nanoimprint lithography (NIL) to fabricate centimeter-scale nanometer components, aiming to replace electron beam lithography and traditional exposure machines for producing centimeter-scale devices and achieving mass production. Compared to traditional methods, nanoimprint lithography offers advantages such as low cost, high efficiency, and rapid fabrication. In our experiments, we successfully used both thermal nanoimprint and UV-curable nanoimprint techniques to create centimeter-scale grating elements. These grating elements are mainly used for pupil expansion functions in light guides. Additionally, we employed rigorous coupled-wave analysis (RCWA) to simulate the diffraction efficiency of the gratings and compared the simulation results with actual measurements. The results showed that the error between the simulation and measurement was less than 5%, demonstrating the high consistency and reliability of the optical performance of our fabricated grating elements. This research highlights the significant potential of nanoimprint lithography in producing high-precision, large-area optical components and provides an efficient and feasible technical pathway for future optical component manufacturing. The success of this study not only offers a new solution for the production of light guide components but also lays the foundation for extending nanoimprint lithography applications to other optical and electronic components. In the future, we will further optimize the imprinting process to enhance component performance to meet more application needs. |
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