本研究計畫目的在於開發以軟性材質之塑膠基板上製鍍多層薄膜來製作干涉濾光片。在開發軟性基板的鍍膜技術時，所遭遇到最重要的問題將會是薄膜與軟性基板之間的應力問題、低溫製程問題、同時伴隨著薄膜附著性的問題。因此，為達成此研究目的，本研究計畫選用低能量或脈衝式離子源進行離子助鍍膜（IAD），不但能降低製程溫度且可以得到較好的光學特性，除此之外，還利用結構多層薄膜之自我複製法作為製作元件的方法。在物理氣相沈積(PVD) 的鍍膜製程中，由於電子槍蒸鍍法製鍍的氧化膜，堆積動能不夠大，原子表面的遷移率(mobility)偏低，膜成長的比較鬆散，結構較疏鬆，而呈現張應力的現象，如果加上離子助鍍法製鍍氧化膜，因為藉著離子的能量而提高了沈積分子的動能、動量及分子結合的機率，使沈積分子具有較高的遷移率，增加了膜結構的緊密性，空隙減少，隨著IAD 轟擊的能量增加，膜應力由張應力轉為壓應力。離子束濺鍍是藉由動量傳遞將材料以一顆顆原子或分子沈積於基板上，由於碰撞散射的機會小，指向性良好，原子撞擊效應，使得遷移率增高，膜質更加緊密，故大多呈現壓應力。因此在適當的離子源參數下可以得到較小的應力。而在結構多層薄膜之自我複製法上，本計劃將利用電子鎗(electron gun)蒸鍍、離子束濺鍍(Ion Beam Sputtering)和磁控濺鍍(Magnetron Sputtering)等不同方法將光學薄膜製鍍在二維奈米成型圖案上，再輔以加熱或離子源助鍍(ion assisted deposition)，以製作出自我複製方式的奈米薄膜元件。蒸鍍的光學薄膜工作波長根據不同元件設計將在深紫外光、紫外光、可見光到近紅外光波段等。在應用方面則利用上述之研究結果製鍍各種濾光片，例如以有機材料製作的軟性顯示器(OLED)需要UV cut off filter；軟性顯示器或是軟性照明系統在色彩調整或校正上所需的Color Compensator；軟性顯示器(TFT)需要的偏振分光鏡、相位板；在太陽能控制上的Solar energy controlled filter；及各種抗反射膜、高反射鏡、帶通濾光片等都屬於此領域之濾光片。 This is a proposal regarding the deposition of thin films on flexible substrates for optoelectronics applications. The solution for the several problems such as stress, low temperature process and adhesion was proposed. To achieve the purpose, the low ion-voltage ion source or pulse ion source will be applied to execute ion-beam assisted deposition (IAD) to reduce the process temperature and improve the quality of films. Moreover, autocloning method will be also applied to fabricate structural thin film to develop the low-stress optical thin films. Normally, the kinetic energy of the coating material during the physical vapor deposition is too small to approach the high mobility on the surface of the substrate. The structure of the film is loose and behaves compress stress. When using IAD process, the coating material is bombarded by the ion to obtain high kinetic energy. So, the structure of the film is dense and behaves from compress stress to strain stress according to the energy of the ion. Based on the property the stress of the film can be controlled by varying the parameters of the ion source. By another way of reducing the stress of films, autocloning method will be also applied to fabricate structural thin film to develop the low-stress optical thin films. The coating methods of E-beam gun, Ion Beam Sputtering and Magnetron Sputtering will be applied to fabricate optical thin films on the substrate with two-dimensional structure. Based on the working wavelength, the nano structures must be constructed at different periods by exposure systems of optical lithography. The periods of the structures must be in the scale of sub-wavelength. Therefore, the E-beam writer is the optimal lithography system for an application when the working wavelength is from UV to near IR. Several type of filters coated on flexible substrates will be fabricated. Those are including UV cut off filter for OLED, color compensator for display and lighting, polarizer and phase retarder for display, solar energy control filter, antireflection coatings, high reflection coating and band pass filters. The stress and adhesion of those filter coated on flexible substrates will be investigated under standard test procedure. 研究期間 : 9808 ~ 9907
