Residual stress of graded-index-like films deposited by radio frequency ion-beam sputtering

NCUIR > Research Center > Thin Film Technology Center > journal & Dissertation > Item 987654321/27738

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/27738

Title:	Residual stress of graded-index-like films deposited by radio frequency ion-beam sputtering
Authors:	Tang,CJ;Jaing,CC;Wu,K;Lee,CC
Contributors:	薄膜技術中心
Keywords:	COMPOSITE THIN-FILMS;OXIDE-FILMS;INTRINSIC STRESS;INTERNAL-STRESS;COEVAPORATION;GROWTH
Date:	2009
Issue Date:	2010-06-29 19:16:03 (UTC+8)
Publisher:	中央大學
Abstract:	In this study, Ta2O5-SiO2 Composite films with various proportions of Ta2O5 were prepared by radio frequency ion-beam sputtering deposition. The residual stress of each composite film was analyzed. The residual stresses of different graded-index-like layers made of composite films were studied. The results show that the residual stress of a single layered composite film was lower than that of pure SiO2 or a pure Ta2O5 film. Furthermore, when the composite film was made graded-index-like, the residual stress was reduced. (C) 2008 Elsevier B.V. All rights reserved.
Relation:	THIN SOLID FILMS
Appears in Collections:	[Thin Film Technology Center] journal & Dissertation

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