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資料載入中.....
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請使用永久網址來引用或連結此文件:
http://ir.lib.ncu.edu.tw/handle/987654321/2821
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| 題名: | 磨料噴射精微加工之研究;A Study on Abrasive Jet Technology for Micro-Machining |
| 作者: | 蔡逢哲;Feng-Che Tsai |
| 貢獻者: | 機械工程研究所 |
| 關鍵詞: | 霧化法;磨料噴射加工;放電加工;田口品質工程;Gas Atomization;Taguchi Method;Abrasive Jet Machining;Electrical Discharge Machining |
| 日期: | 2008-05-15 |
| 上傳時間: | 2009-09-21 11:57:06 (UTC+8) |
| 出版者: | 國立中央大學圖書館 |
| 摘要: | 本研究主要研發一套磨料噴射精微拋光技術，並利用自行研發具滑動研磨功能之蠟砂，探討對不同SKD61模具鋼加工及形狀表面的拋光改善效果。經由實驗發現採用田口方法所獲得之磨料噴射最適參數水準組合，以#2000SiC與添加劑混合比例500: 1000: 1500(水蠟: 磨料: 水)條件下，可於90 min內將表面粗糙度7.74 μm Rmax的放電表面改善至0.45 μm Rmax，且表面呈現近似鏡面反射效果。對於2.32 μm Rmax開放式微槽、3.45 μm Rmax直線型封閉式微槽與3.58 μm Rmax曲線型封閉式微槽表面，以#3000SiC磨粒在相同加工條件下，可分別於30 min、60 min與60 min時，將表面改善至0.40 μm Rmax、0.43 μm Rmax與0.45 μm Rmax的拋光效果。同時研究創新以霧化法製作具滑動功能的複合磨料(#3000蠟砂)，發現經磨料噴射後對於表面粗糙度3.26 μm Rmax的研磨表面，可於拋光時間45 min內，將表面改善至0.31 μm Rmax的鏡面效果；另外對於2.32 μm Rmax的開放式微槽、3.45 μm Rmax的直線型封閉式微槽與3.58 μm Rmax的曲線型封閉式微槽表面，分別於30 min、60 min和75 min時，可將表面改善至0.31 μm Rmax、0.35 μm Rmax與0.40 μm Rmax的表面拋光效果，證明磨料噴射拋光法結合蠟砂複合磨料，可明顯縮短拋光時間並獲得極佳的表面改善效果。 This study introduces an Abrasive Jet Polishing (AJP) technique to improve the polishing performance. Furthermore, a Gas Atomization technique is employed to fabricate Wax-coated #3000SiC particles, investigations to establish the optimal AJP parameters for the surface finishing of different SKD61 mold steel specimens shape and processed. Taguchi design experiments are performed to identify the optimal AJP parameters when applied to the polishing of SKD61 mold steel specimens. Using #2000SiC particles were mixed with water wax and pure water in a ratio of 500: 1000: 1500 (Water Wax: SiC particles: Pure Water). Following 90 minutes of blasting, the surface roughness is improved from an initial value of 7.74 μm Rmax to 0.45 μm Rmax, thereby obtain a mirror-like surface finish. AJP polishing of the micro-grooving SKD61 surface, Linear type micro-channel SKD61 surface and Curvee type micro-channel SKD61 surface using #3000SiC particles mixed with water wax and pure water in the ratio 500:1000:1500 (Water Wax: SiC particles: Water) reduces the surface roughness from an initial value of Rmax = 2.32 μm, Rmax = 3.45 μm and Rmax = 3.58 μm to a final value of Rmax = 0.40 μm, Rmax = 0.43 μm and Rmax = 0.45 μm within 30 minutes, 60 minutes and 60 minutes, respectively. Gas Atomization system used in this study to fabricate the Wax-coated #3000SiC particles. AJP polishing of the ground SKD61 surface using wax-coated #3000SiC particles mixed with water wax and pure water in the ratio 500: 1000: 1500 (Water Wax: SiC particles: Water) reduces the surface roughness from an initial value of Rmax = 3.26 μm to a final value of Rmax = 0.31 μm within 45 minutes. In addition, using wax-coated #3000SiC particles of the micro-grooving SKD61 surface, Linear type micro-channel SKD61 surface and Curvee type micro-channel SKD61 surface reduces, the surface roughness from an initial value of Rmax = 2.32 μm, Rmax = 3.45 μm and Rmax = 3.58 μm to a final value of Rmax = 0.31 μm, Rmax = 0.35 μm and Rmax = 0.40 μm within 30 minutes, 60 minutes and 75 minutes, respectively. Overall, the results show that the use of wax-coated abrasive particles reduces the polishing time and achieves an improved surface finish. |
| 顯示於類別: | [機械工程研究所] 博碩士論文
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