The influence of titanium on the properties of zinc oxide films deposited by radio frequency magnetron sputtering

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題名:	The influence of titanium on the properties of zinc oxide films deposited by radio frequency magnetron sputtering
作者:	Chung,Jeng-Lin;Chen,Jyh-Chen;Tseng,Chung-Jen
貢獻者:	機械工程研究所
關鍵詞:	CHEMICAL-VAPOR-DEPOSITION;DOPED ZNO FILMS;AL THIN-FILMS;ELECTRICAL-PROPERTIES;OPTICAL-PROPERTIES;SIMULTANEOUS RF;TRANSPARENT;TEMPERATURE;TI;PRESSURE
日期:	2008
上傳時間:	2010-07-06 16:18:10 (UTC+8)
出版者:	中央大學
摘要:	TiO2-doped zinc oxide thin films were deposited on glass substrates by radio frequency (RF) magnetron sputtering with TiO2-doped ZnO targets in an argon atmosphere. The structural properties of TiO2-doped ZnO films doped with different TiO2 contents were
關聯:	APPLIED SURFACE SCIENCE?
顯示於類別:	[機械工程研究所] 期刊論文

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