SiO2-isolated visible amorphous thin-film LED fabricated on crystalline silicon substrate

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Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/32565

Title:	SiO2-isolated visible amorphous thin-film LED fabricated on crystalline silicon substrate
Authors:	Yeh,RH;Lin,CS;Liu,WH;Hong,JW
Contributors:	電機工程研究所
Keywords:	ELECTROLUMINESCENCE;DIODES
Date:	2002
Issue Date:	2010-07-06 18:32:16 (UTC+8)
Publisher:	中央大學
Abstract:	SiO2-isolated Si-based n-a(amorphous)-Si:H/i-a-SiC:H/p-a-Si:H thin-film LEDs (TFLEDs) with n-a-Si/n-type crystalline silicon (c-Si) hetero-interface have been proposed and fabricated successfully on an n/n(+) c-Si wafer. The obtained TFLEDs revealed a bri
Relation:	ELECTRONICS LETTERS
Appears in Collections:	[Graduate Institute of Electrical Engineering] journal & Dissertation

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