Fluoride antireflection coatings deposited at 193 nm

NCUIR > Research Center > Thin Film Technology Center > journal & Dissertation > Item 987654321/35653

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35653

Title:	Fluoride antireflection coatings deposited at 193 nm
Authors:	Liu,Ming-Chung;Lee,Cheng-Chung;Liao,Bo-Huei;Kaneko,Masaaki;Nakahira,Kazuhide;Takano,Yuuichi
Contributors:	薄膜技術研究中心
Keywords:	MICROSTRUCTURAL PROPERTIES;OPTICAL COATINGS;THIN-FILMS;ULTRAVIOLET;MGF2;LITHOGRAPHY;EVAPORATION;GROWTH;BOAT
Date:	2008
Issue Date:	2010-07-07 15:47:08 (UTC+8)
Publisher:	中央大學
Abstract:	Antireflection coatings for 193 nm composed of low-index (MgF2 and AlF3) and high-index (LaF3 and GdF3) materials are deposited by the resistive heating boat method at a substrate temperature of 300 degrees C. The optical characteristics (reflectance and
Relation:	APPLIED OPTICS
Appears in Collections:	[Thin Film Technology Center] journal & Dissertation

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