TiO2-Ta2O5 composite thin films deposited by radio frequency ion-beam sputtering

NCUIR > Research Center > Thin Film Technology Center > journal & Dissertation > Item 987654321/35680

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35680

Title:	TiO2-Ta2O5 composite thin films deposited by radio frequency ion-beam sputtering
Authors:	Lee,Cheng-Chung;Tang,Chien-Jen
Contributors:	薄膜技術研究中心
Keywords:	TIO2-SIO2 MIXED FILMS;OPTICAL-PROPERTIES;OXIDE-FILMS;INTRINSIC STRESS;COEVAPORATION;CONSTANTS
Date:	2006
Issue Date:	2010-07-07 15:47:48 (UTC+8)
Publisher:	中央大學
Abstract:	TiO2-Ta2O5 composite films were prepared by a radio frequency ion-beam sputtering deposition process, and the refractive indices and extinction coefficients of the composite films were found to be between those of the TiO2 and Ta2O5 films. The structure o
Relation:	APPLIED OPTICS
Appears in Collections:	[Thin Film Technology Center] journal & Dissertation

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