低表面能材料於超疏水表面製備與奈米壓印微影技術之應用; Fabrication of Super Hydrophobic Surface and Application of Nanoimprint Lithography with Low Surface Energy Material

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Title:	低表面能材料於超疏水表面製備與奈米壓印微影技術之應用;Fabrication of Super Hydrophobic Surface and Application of Nanoimprint Lithography with Low Surface Energy Material
Authors:	邱士峰;Shih-Feng Chiou
Contributors:	化學工程與材料工程研究所
Keywords:	超疏水表面;電子束微影;低表面能材料;奈米壓印;nanoimprint;electron beam lithography;low surface energy material;super hydrophobic surface
Date:	2005-06-02
Issue Date:	2009-09-21 12:24:57 (UTC+8)
Publisher:	國立中央大學圖書館
Abstract:	在本篇論文有兩個主題，一個是超疏水表面的研究另一個是奈米壓印脫膜劑的研發。此段為第一個主題超疏水表面在自然界有很多例子，例如有名的蓮葉效應(lotus effect)，在本研究主題即是探討利用熱交聯性高分子旋塗於晶圓上，以Ar、CF4電漿和烘烤處理材料表面，製備出超疏水表面，其靜態接觸角超過150°之表面。以AFM、SEM觀察其表面形貌，以FTIR、ESCA觀察其化學結構。且其表面也是一個超疏油表面，謂之超雙疏表面，並計算其表面能。接下來為第二個主題，奈米壓印製程主要仰賴mold與光阻間的接觸，是故在此二者接觸時的濕性與黏滯性質是關鍵的議題。而mold與光阻接觸時的黏滯力強度是由表面能大小。我們以一低表面能之熱交聯性高分子當作奈米壓印之脫膜劑，發展一個新的脫膜劑在奈米壓印技術上以求得良好效果。 There are two major topics in my research. One is the research of super hydrophobic surface. The other one is nanoimprint lithography. The following is the first major topic. We coat polymer on the wafer and then deal with surface by plasma. We can obtain super hydrophobic surface. We use AFM and SEM to see the top view. We can use FTIR and ESCA to see chemical structure. In following is the second major topic. In this research, we develop a new material of mold release agents. We coat this material on the wafer and we design the thin film from three to seven nanometers. Then, we use the mold to imprint on the NEB. We can obtain nice effect.
Appears in Collections:	[National Central University Department of Chemical & Materials Engineering] Electronic Thesis & Dissertation

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