抗反射層製作與奈米孔洞二氧化矽薄膜應用在光致發光材料; Fabrication of anti-reflective films and the photoluminescence of mesoporous silica

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Title:	抗反射層製作與奈米孔洞二氧化矽薄膜應用在光致發光材料;Fabrication of anti-reflective films and the photoluminescence of mesoporous silica
Authors:	游世明;Shih-ming You
Contributors:	化學工程與材料工程研究所
Keywords:	光子晶體;二氧化矽;介孔材料;光致螢光;橢圓儀;抗反射;silica;mesoporous;photoluminescence;ellipsometry;antireflective;photonic crystal
Date:	2007-07-20
Issue Date:	2009-09-21 12:28:00 (UTC+8)
Publisher:	國立中央大學圖書館
Abstract:	第一個研究目的在於簡易的製作出抗反射薄膜，利用電漿處理有機高分子，使其表面變得粗糙不平整，達到與繁複的半導體製程所製作出的抗反射層透膜與太陽電池抗反射表面有著相同的效果，期望可以應用在太陽電池或顯示器表面的抗反射膜，取代傳統的半導體製程抗反射層，且因表面能的緣故，可有效阻隔水氣對太陽電池的侵入，防止電池壽命減短。第二部分在於利用奈米孔洞二氧化矽本身的孔洞缺陷，因為量子侷限效應(quantum confinement effect)的關係，而增加且增強二氧化矽的發光效率，其發光波長坐落在可見光波段，改變其孔隙率來變更發光的波段，最後在二氧化矽薄膜上利用半導體製程製作二維光子晶體，減少螢光的散射損失，使螢光能依循單一方向行進，使其能再增加發光強度，期望能有與LED有著相同的發光效果。 The first subject is to fabricate the anti-reflective films easily. We use Ar plasma exposure to modify BA-m benzoxazine surface, the surface profile will be roughen, and the films will exhibit the anti-reflective properties. Compare to the traditional semiconductor fabrication, the process is much simpler, and . And the surface energy of BA-m polybenzoxazine film is low enough, the contact angle of water excess 90˚. In other words, the film have hydrophobic property. The second subject is to investigate the photoluminescence of mesoporous silica(MS), because of the quantum confinement effect, the nano pores in MS film can increase its luminescence efficiency. We fabricate 2D photonic crystal on silicon substrate, and then spin MS on the photonic crystal structures. The photonic crystal can confine the luminescence of mesoporous silica, to reduce the light scattering.
Appears in Collections:	[National Central University Department of Chemical & Materials Engineering] Electronic Thesis & Dissertation

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