本論文主要是利用拉曼光譜儀及近紅外光-可見光-紫外光(UV-VIS-NIR)光譜儀，來研究以電漿輔助化學氣相沉積 (Plasma Enhanced Chemical Vapor Deposition，PECVD) 方式，製成的含氫非晶質碳(hydrogenated amorphous carbon)薄膜樣品之拉曼光譜、可見光穿透率等特性。我們實驗用的樣品，是由三種反應氣體(Precursor Gas)[ C6H6 、HMDS (六甲基二矽氮烷，分子式為C6H18Si2NH)、HMDSO(六甲基二矽氧烷，分子式為C6H18Si2O)]，以不同比例、不同鍍膜時間(Deposition Time) 製造而成的。由實驗結果我們發現:以C6H6為反應氣體的樣品，其碳的sp2鍵結(石墨的結構)含量最多，故可見光穿透率最小(鍍膜時間為90min時的平均光穿透率約為10%);以HMDS為反應氣體的樣品，其碳的sp2鍵結(石墨的結構)含量最少，故可見光穿透率最大(鍍膜時間為90min時的平均光穿透率約為60%)。以C6H6為反應氣體的樣品的相對光學能隙最小[平均值約為1.0(ev)]，而以HMDS為反應氣體的樣品的相對光學能隙則是最大[平均值約為2.1(ev)]。三種樣品(以HMDS為反應氣體的樣品、以HMDSO為反應氣體的樣品、以HMDS+HMDSO為反應氣體的樣品)的光學能隙和被扭曲的碳的sp3鍵結含量，皆會隨著鍍膜時間的增加(由60min到90min)而增加。 In this thesis,we use mainly the Raman spectroscopy and UV-VIS-NIR spectroscopy to study the characteristics of hydrogenated amorphous carbon thin films which are made by the Plasma Enhanced Chemical Vapor Deposition (PECVD) method. These films were made in different ratios of precursor gas[C6H6 ,HMDS(C6H18Si2NH) and HMDSO(C6H18Si2O)] and deposition time(30min,60min,and 90min).The experimental results are as follows: films which use C6H6 as its precursor gas contain most sp2 bondings of carbon,as a result, have the lowest transmittance of visual light(the average transmittance is about 10% in deposition time of 90min); films which use HMDS as its precursor gas contain least sp2 bondings of carbon,as a result, have the highest transmittance(the average transmittance is about 60% in deposition time of 90min). Films which use C6H6 as its precursor gas have the smallest relative optical gap[the average value is about 1.0 (e.v.)],and films which use HMDS as its precursor gas have the largest relative optical gap[the average value is about 2.1 (e.v.)].Films which use HMDS,HMDSO,and HMDS+HMDSO respectively as its precursor gas have both its relative optical gap and sp3 bondings of carbon increased as deposition time increases.
