English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 80990/80990 (100%)
造訪人次 : 41246884      線上人數 : 658
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜尋範圍 查詢小技巧:
  • 您可在西文檢索詞彙前後加上"雙引號",以獲取較精準的檢索結果
  • 若欲以作者姓名搜尋,建議至進階搜尋限定作者欄位,可獲得較完整資料
  • 進階搜尋


    請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/52879


    題名: Comparative study of physical properties of vapor chopped and nonchopped Al(2)O(3) thin films
    作者: Tamboli,SH;Puri,V;Puri,RK;Patil,RB;Luo,MF
    貢獻者: 物理學系
    關鍵詞: SPRAY-PYROLYSIS;EVAPORATION;ADHESION;STRESS
    日期: 2011
    上傳時間: 2012-06-11 10:48:10 (UTC+8)
    出版者: 國立中央大學
    摘要: Aluminium oxide being environmentally stable and having high transmittance is an interesting material for optoelectronics devices. Aluminium oxide thin films have been successfully deposited by hot water oxidation of vacuum evaporated aluminium thin films. The surface morphology, surface roughness, optical transmission, band gap, refractive index and intrinsic stress of Al(2)O(3) thin films were studied. The cost effective vapor chopping technique was used. It was observed that, optical transmittance of vapor chopped Al(2)O(3) thin film showed higher transmittance than the nonchopped film. The optical band gap of vapor chopped thin film was higher than the nonchopped Al(2)O(3), whereas surface roughness and refractive index were lower due to vapor chopping. (C) 2011 Elsevier Ltd. All rights reserved.
    關聯: MATERIALS RESEARCH BULLETIN
    顯示於類別:[物理學系] 期刊論文

    文件中的檔案:

    檔案 描述 大小格式瀏覽次數
    index.html0KbHTML440檢視/開啟


    在NCUIR中所有的資料項目都受到原著作權保護.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 隱私權政策聲明