中大機構典藏-NCU Institutional Repository-提供博碩士論文、考古題、期刊論文、研究計畫等下載:Item 987654321/58566
English  |  正體中文  |  简体中文  |  Items with full text/Total items : 78937/78937 (100%)
Visitors : 39854185      Online Users : 350
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version


    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/58566


    Title: 大尺寸金屬有機化學氣相沉積反應腔之數值分析模擬研究;The simulation analysis of a large-size MOCVD reactor
    Authors: 胡智愷;ZHI-KAI,HU
    Contributors: 能源工程研究所
    Keywords: 金屬有機化學氣相沉積;加熱器;熱流場;反應腔體;發光二極體
    Date: 2012-11-27
    Issue Date: 2012-12-25 13:37:02 (UTC+8)
    Publisher: 國立中央大學
    Abstract: MOCVD為製造發光二極體(LED)的關鍵設備,MOCVD系統的組件大致可分為:反應腔、氣體控制系統、反應源及廢氣處理系統等。 反應腔體為MOCVD過程中發生化學反應的地方,腔體與氣體供應系統連接,並藉由噴嘴(nozzle)或噴氣頭(showerhead)將氣體混合;腔體材質通常採用不鏽鋼製作,腔體的內壁則由石英或是高溫陶瓷構成內襯,而腔體中的乘盤置於加熱器之上。MOCVD反應腔的設計對薄膜厚度均勻性和品質而言非常關鍵,本文以CFD計算流體力學軟體Fluent針對大尺寸近耦合MOCVD反應腔體設計做一研究探討,並以載台與進氣口間隙、腔體壁面溫度、進氣口溫度、載台旋轉速度、壓力變化等作為研究參數。初步探討大尺寸下MOCVD腔體內部熱流場之行為。本研究結果也將提供設計大尺寸近耦合MOCVD反應腔體的基本架構.MOCVD is a key process for Light Emitting Diode industry, and the main components in a MOCVD system include reaction chamber, gas control system, MO source system and scrubber.Basically, the reaction chamber connected with the gas supply system is a place where chemical reaction happened for MOCVD process. It makes MO source and carrier gas into a mixed gas by using the gas inlet system nozzle or showerhead. Generally, the material of the reactor is stainless steel, and the chamber wall is usually made by quartz or ceramics, and the susceptor is placed upper to the heater.Design of a MOCVD reactor is very critical for epitaxy thin film uniformity and also the quality. A numerical Analysis for a large size closed-spaced MOCVD reactor will be developed by introducing the existing software Computational Fluid Dynamics FLUENT in this research. The numerical parameters will involve space between gas inlet and susceptor, wall temperature, gas inlet temperature, susceptor rotation rate, chamber pressure and so on. In the paper, we primarily investigate the behavior for thermal flow field of a large size close-spaced MOCVD reactor. Additionally, the results of this study can be used as a basic frame work for designing a large size close-spaced MOCVD reactor.
    Appears in Collections:[Energy of Mechatronics] Electronic Thesis & Dissertation

    Files in This Item:

    File Description SizeFormat
    index.html0KbHTML850View/Open


    All items in NCUIR are protected by copyright, with all rights reserved.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 隱私權政策聲明