考量基板旋轉效應之適應性光學輔助濺鍍白金薄膜及奈米纖維墊表面粗糙度量測系統; Adaptive optics integrated surface roughness measurement of sputtered Pt film and electrospun nanofibrous mat considering the substrate rotation effect

NCUIR > Engineering College > Graduate Institute of Mechanical Engineering > Electronic Thesis & Dissertation > Item 987654321/61252

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/61252

Title:	考量基板旋轉效應之適應性光學輔助濺鍍白金薄膜及奈米纖維墊表面粗糙度量測系統;Adaptive optics integrated surface roughness measurement of sputtered Pt film and electrospun nanofibrous mat considering the substrate rotation effect
Authors:	王加和;Wang,Chia-he
Contributors:	機械工程學系
Keywords:	適應性光學;表面粗糙度;白金薄膜;adaptive optics;surface roughness;PT thin film
Date:	2013-07-16
Issue Date:	2013-08-22 12:16:09 (UTC+8)
Publisher:	國立中央大學
Abstract:	本論文是結合適應性光學系統和二值化定理來量測表面粗糙度及增進準確性。本論文研究主要為下列三大部份，(1) 利用適應性光學系統輔助量測矽基底白金薄膜表面粗糙度，(2) 適應性光學系統結合二值化影像輔助旋轉表面之表面粗糙度量測，(3) 即時光學量測方法探討遠場電紡織過程纖維孔隙率變化。 (1) 利用適應性光學系統輔助矽基底白金薄膜表面粗糙度量測: 本研究中，我們提出一個結合光學散射原理和適應性光學系統，可應用於動態表面粗糙度的即時量測方法。本研究的目的主要是要將有氣體擾動的區域所造成的像差利用適應性光學系統做補償。本研究共使用四組白金薄膜試片，粗糙度範圍從58至83奈米，量測結果其光強度值和表面粗糙度值表現出良好的相關性其相關係數高達0.9963。 (2) 適應性光學系統結合二值化影像量測旋轉表面之表面粗糙度：本文將光學量測技術應用在轉速高達1500rpm之旋轉表面的薄膜基板的表面粗糙度之研究。光學量測方法因旋轉運動的影響，而造成光強度變化和圖像畸變，特別是在圓周區域的速度有著較大影響。因此我們結合適應性光學系統和二值化影像分析，提出了一個即時表面粗糙度的量測方法。利用適應性光學系統輔助校正結果與靜止條件相比較，誤差值可小於3.05％，且在量測前後可以得到較好的一致性。 (3) 即時光學量測方法探討遠場電紡織過程纖維孔隙率變化: 本研究主要探討遠場電紡織技術過程中，結合光學量測方法及二值化影像比較法，推算遠場電紡織纖維沉積過程的孔隙率之研究。由研究結果顯示此量測方法，以量測角度為45°的入射角可得到最好的量測結果，且可以得到一條曲線方程式 y=188.19x2+13.103x+0.2506，可用來做為預測孔隙率與光功率密度相對應之關係式。 This study is a combination of the optical scattering phenomenon and an adaptive optics system to improve the accuracy of the measurement of surface roughness and porosity. The focus of the study is： (1) Adaptive optics integrated surface roughness measurement of sputtered Pt film on silicon substrate: In this study, we present an in-process measurement of surface roughness by combining an optical probe of laser-scattering phenomena and adaptive optics for aberration correction. The aim of this study was to demonstrate the necessity for Adaptive Optics (AO) compensation in regions containing turbulences. Measurement results of eight Pt film on top of P-type silicon wafer samples with a roughness ranging from 58 to 83 nm demonstrate excellent correlation between the peak power and average roughness with a correlation coefficient (R2) of 0.9963. The proposed AO-assisted system is in good agreement with stylus method and less than 0.70 % error values are obtained for the aforementioned average sample roughness. (2) In-situ roughness measurement on rotationally moving surfaces using binarized image and adaptive optics: In this article, an optical technique which allows the roughness measurement of sputtered thin film on silicon surface under high rotational speed up to 1500rpm was developed. The rotationally moving effect hinders most in-situ optical inspection methods due to the induced disturbance and image aberration, particularly in the circumferential region where the speed reaches the maximum. We present an in-situ measurement of surface roughness that is combining on adaptive optics (AO) and binary analysis of speckle pattern images. The proposed AO-assisted system is in good agreement with the still condition and less than 3.05% error values can be consistently obtained. (3) An in-situ optical method for monitoring electrospinning process and porosity characterization: In this paper, an in-situ analysis based method for electrospun nanofiber porosity measurement has been presented. An optical inspection system for rapidly measuring the porosity of electrospinning process is developed in this study. It is found that the incident angle of 45o is a good candidate for measuring porosity of electrospinning process and y = 188.19x2 + 13.103x + 0.2506 is a trend equation for predicting the porosity of electrospinning process.
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