光學導納監控與檢測系統開發;Development of Monitoring and Testing System for Optical Admittance

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/62583

Title:	光學導納監控與檢測系統開發;Development of Monitoring and Testing System for Optical Admittance
Authors:	李正中
Contributors:	國立中央大學光電科學與工程學系
Keywords:	光電工程
Date:	2012-12-01
Issue Date:	2014-03-17 11:51:33 (UTC+8)
Publisher:	行政院國家科學委員會
Abstract:	研究期間：10108~10207;A novel monitor system will be developed in this project to extract the real-time reflection phase and magnitude of monitoring light coming from a growing thin film stack. A new-type dynamic polarization interferometer will be applied in the system to erase the mechanical vibration and air turbulence effect and obtain the reflection coefficient, optical admittance, refractive index and thickness at every moment. It provides powerful and global monitoring for optical coatings. In conventional monitors, only light intensity is monitored, but the optical phase cannot be observed, so that neither refractive index nor thickness can be known. Therefore the deposition process is not able to be precisely controlled resulting in the low yield efficiency of some optical elements, such as laser line filter, DWDM, etc. This project is going to build a new monitoring system to solve this long-time problem, and implement an optical admittance loci monitor analysis to have an error compensations scheme. Optical admittance loci are generally applied in filter designs and error compensations calculations in coating production. Since they have intensity magnitude and optical phase information, by analyzing the optical admittance of one single reference wavelength, we can keep the whole output spectrum satisfy what we have designed. Unlike other recently developed monitoring method, in our monitor system, optical admittance is not acquired from tuning points of transmittance curve under the incorrect assumption, such as refractive index is constant, and is not necessary to be converted back to transmittance. The variations of refractive index and thickness in monitoring area at every moment can be observed in this system. This would greatly help the understanding of thin film growth mechanism. Optical admittance locus monitor has high sensitivity on manufacturing a quarterwave stack, and the sensitivity increase as layer number increase. It avoids the major defect when using the conventional turning point monitor in which sensitivity become poor in quarter-wave stack fabrication. Therefore, the monitor method in this project would greatly improve the control precision and decrease the cost for the production of sophisticate optical filters.
Relation:	財團法人國家實驗研究院科技政策研究與資訊中心
Appears in Collections:	[Department of Optics and Photonics] Research Project

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