以陽極處理法製備奈米孔洞陣列光電元件; Electro-optical Devices on Anodic Aluminum Oxide Nano-channel Arrays

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/63468

Title:	以陽極處理法製備奈米孔洞陣列光電元件;Electro-optical Devices on Anodic Aluminum Oxide Nano-channel Arrays
Authors:	陳君閣;Chen,Chun-Ko
Contributors:	光電科學與工程學系
Keywords:	陽極氧化鋁;換酸;奈米孔洞陣列;anodic aluminum oxide;multi-electrolyte-step;nano-channel arrays
Date:	2014-01-09
Issue Date:	2014-04-02 15:24:07 (UTC+8)
Publisher:	國立中央大學
Abstract:	本研究以陽極處理法(AAO)製備奈米孔洞陣列基板，並應用於四種不同的光電元件。研究重點在探討以大週期奈米壓印模控制孔洞生長位置和多步驟生長(multi-step)法對孔洞生長品質的影響，並提出換酸陽極氧化法(multi-electrolyte-step)，先在磷酸中生長大週期的孔洞，再以化學溶解使其形成碗狀結構，接著換至草酸中用較小偏壓生長真圓度佳且規則排列的孔洞。根據奈米孔洞的真圓度分析以及平均週期的計算，在120-150 V的高外加偏壓下，其孔洞陣列的週期介於230-310 nm，標準差小於25 nm，孔洞的真圓度則超過0.85。在基板應用上，本研究亦將基板應用於各類元件: 以翻印的方式在矽基板上蝕刻週期220 nm的錐狀抗反射結構，其反射率小於2%，並製作為異質接面太陽能電池，其太陽能電池效率增益達16%。以週期150 nm的陽極氧化基板搭配多層膜堆設計，製作出藍光區410-460 nm平均反射率92%的全方位反射鏡，讓60度斜向入射時的中心波長控制增益33%。也用模板結合原子層沉積法(Atomic Layer Deposition)，在透明導電膜基板上製作週期僅90 nm 的二氧化鈦奈米管陣列，並以其作為染料敏化太陽能電池之工作電極。亦配合電鍍技術，製備出具表面電漿效應的銅奈米顆粒陣列。; Nano-channel arrays were grown by an anodic aluminum oxide (AAO) method and applied to four kinds of photonic devices. The multi-step and nano-imprinting AAO processes were developed to grow high quality nano-channel arrays. Besides, a novel process of multi-electrolyte-step (MES) AAO was proposed to fabricate nano-channel arrays with better quality. The first AAO nano-channel arrays with large period of 200-350 nm were grown in phosphoric acid. Then the bowl structures were formed by chemical dissolution. The second AAO nano-channel arrays were grown from the bottom of the bowl structures in oxalic acid at a small bias voltage. To analyze the quality of MES AAO, the standard deviation of the nano-channel arrays was less than 25 nm at 120-150 volts; and the circularity was larger than 0.85. There were several photonic devices applied to the AAO nano-channel arrays. As a template, the anti-reflectance structure of the nano-cone arrays was etched on the n-type silicon wafer. The reflectance of nano-cone arrays with a period of 220 nm was less than 2%. And the heterojunction silicon solar cell with the structures was higher than 16% of the photonic-electrical efficiency. The autocloned multi-layers have also been coated on an AAO template with a period of 150 nm. A 92% reflectance of the omni-directional reflector (ODR) could be achieved in the spectrum range of 410-460 nm. There was 33% improvement of central wavelength shift for the ODR with 60 degree of the incident angle. Besides, the AAO method has also combined with atomic layer deposition (ALD) to grow TiO2 nano-channel arrays on a fluorine doped tin oxide (FTO) glass to apply to a dye sensitized solar cell for increasing the photo-induced current. Finally, the copper nano-particle arrays had also been grown on the AAO template by electroplating to enhance the surface plasma response effect.
Appears in Collections:	[Graduate Institute of Optics and Photonics] Electronic Thesis & Dissertation

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