一種應用於投影式曝光機的大口徑投影光學系統

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題名:	一種應用於投影式曝光機的大口徑投影光學系統
作者:	林楷傑;Lin,Kai-jie
貢獻者:	光機電工程研究所
關鍵詞:	投影式曝光機
日期:	2014-05-29
上傳時間:	2014-08-11 19:04:35 (UTC+8)
出版者:	國立中央大學
摘要:	本論文主要是提供一種設計技術，此技術可應用於投影式曝光機的投影光學系統設計，此投影光學系統使用之透鏡，口徑約為直徑30cm 左右，曝光光罩為長條形，可針對大面積光阻基板做掃描式曝光。並且使此投影光學系統可微調曝光倍率，以補償曝光製程時光阻基板之脹縮。我們使用三種方法進行初階系統設計，三種方法說明如下，Type1:參考相關專利之參數設定；Type2:參考期刊論文之像差計算方法，計算像差以得到系統參數；Type3:以近軸光學理論計算系統參數。我們比對三種設計方法之模擬結果，發現其有效焦距、像差、微調倍率性能等光學特性均相當接近，可由此確認我們設計方法的合理性。而在不考慮公差的情況下，以系統全域光場MTF≧0.6 為標準，設計結果之最小曝光線寬為7μm左右。另外微調倍率範圍達0.1%、畸變<0.001%、曝光能量均勻性>90%。最後以下列規範標準為前提，對不同設計結果做公差分析:良率90%以上(MTF≧0.6)，蒙地卡羅分析之公差擾動範圍為3 個標準差，曝光最小線寬10μm。分析時以ISO10110 國際公差標準為基準，由於本研究主要強調此設計技術的流程，故設計結果之公差範圍和ISO10110 相比較為嚴苛，但分析結果可提供給設計者在選擇設計方法時，相對客觀的參考依據。關鍵字：成像畸變量、影像對比度、反射屈折系統、修正光學系 This thesis is to provide a design technology that can be applied to the optical system design for the projection-type exposure machine, in which the shape of exposure mask is a long strip. It can be used for the scanning exposure of the photo-resist board with a large scan area. The projection magnification of the exposure mask can be fine-tuned to compensate for the thermal expansion of the substrate under light exposing. There are three different ways to be used for the preliminary design, They are described as the following, Type1: using the parameters from the related patent; Type2: system parameters being calculated by the aberration formula from journal articles; Type3: system parameters being calculated by the theory of paraxial optics. By comparing the simulated results of the three design methods, it is found that the optical specification such as the effective focal length, aberrations, and the ability of projection magnification fine-tuning were very close among them. Thus, it justified the applicability of the design method proposed in this thesis. In the case of not considering manufacturing tolerance, and with MTF≧0.6 as the standard, the minimum line width of our design was about 7μm. In addition, the range of projection magnification fine-tuning was up to 0.1%, the distortion <0.001%, and the uniformity of exposing energy was greater than 90%. Finally, the tolerance analysis of this design was conducted under the following preconditions: the yield value being more than 90% (MTF≧0.6), the range of perturbations for the Monte Carlo analysis being 3 times the standard deviation, and the minimum line width was 10μm. The basis of our tolerance analysis was the international ISO10110 standard. The research of this thesis was focusing on the process of designing techniques. Although the tolerances in this study were more stringent as compared to the ISO10110, the proposed design technology was still a valuable choice for the optical system of the projection-type exposure machine.
顯示於類別:	[光機電工程研究所 ] 博碩士論文

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