論文摘要 在本論文中，我們將設計與先期製作光纖通訊中之分波多工器，它是在矽基板上作出一個光纖的輸入端，凹面梯形光柵及四個光纖的輸出端。我們將用光學軟体(Zemax)作整個分光器的光路設計，包括輸入光纖位置，凹面梯形光柵的位置及輸出光纖的位置。 凹面梯形光柵的設計則是採用傳統的凹面型光柵來作設計，在所謂的 Rowland Circle 上作輸入與輸出，但因要作在平面上，及要在高繞射階數上作繞射，所以光柵要設計成梯形，以提高其繞射效率。 我們將所設計的光波導分光結構(尺寸大小:長12mm，寬2mm)輸入至光波導軟體(BeamPROP)中，實際模擬的結果為 : 產生五個(波長: 1.54，1.545，1.55，1.555，1.56μm) channel passband，其平均半腰寬為0.4nm。 我們也應用半導体製程的方法在矽晶片上作出此分光器的模型，則過程包括製作光罩、曝光、及作蝕刻。其中蝕刻因蝕刻角度要精確以提高繞射效率，所以需要用感應耦合電漿反應離子蝕刻機作乾蝕刻。 Abstract In this thesis, we design the wavelength demultiplexer in the optical communication, which has been fabricated in the primary stage. It will be realized in the silicon wafer, and its elements include a fiber input, a concave diffraction grating and 4 fiber output. We use the optical design software(Zemax) to design the whole optical path layout, including the position of the input fiber, concave diffraction grating and the output fiber. Concave diffraction grating is designed by the Rowland Circle where the input and output fiber are located. Due to diffraction at the high order, the grating is designed as echelle to increase its diffraction efficiency. We import the structure of the wavelength demultiplexer (size:lengh 12mm, width 2mm) into the optical waveguide software(BeamPROP), which resulted in the five (wavelengh:1.54, 1.545, 1.55, 1.555, 1.56μm) Channel Passbands (half-width : 0.4nm) . We shall use the semiconductor processing method to fabricate this device model. The process includes mask design, photolithography, and etching. We shall use the ICP-RIE for etching process to increase the product diffraction efficiency.
