交錯傾斜微結構薄膜在深紫外光區之研究The; Research of Serial bideposition of anisotropic thin film at DUV

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/6953

Title:	交錯傾斜微結構薄膜在深紫外光區之研究The;Research of Serial bideposition of anisotropic thin film at DUV
Authors:	江直融;Chih-Jung Chiang
Contributors:	光電科學研究所
Keywords:	傾斜;紫外;非均向性;薄膜;oblique;birefringence;DUV;thin film
Date:	2007-06-28
Issue Date:	2009-09-22 10:33:05 (UTC+8)
Publisher:	國立中央大學圖書館
Abstract:	本論文以氟化鎂、氟化鑭二種適用在深紫外波段的材料作研究。利用單電子槍，以70度的蒸鍍角度斜向蒸鍍氟化物薄膜，每次旋轉基板半圈使柱狀結構交錯，研究在相同厚度時不同交錯次數下，探討薄膜結構的變化，量測薄膜的應力及在此種交錯傾斜結構下薄膜對P、S偏振光垂直入射時在波長193nm的折射率差異，並且觀察薄膜對水氣的吸收及表面粗糙度。薄膜結構以掃瞄式電子顯微鏡觀察沉積平面之剖面，應力則是以相位移式應力量測干涉儀測量，而兩個方向上的折射率則以光譜儀搭配偏振器的系統做量測，並配合以包絡法做擬合求得，水氣的吸收是利用傅立葉轉換紅外線光譜儀觀察，表面粗糙度則是利用原子力顯微鏡量測。研究發現，隨著交錯層數的增加，薄膜的雙折射性有增大的現象，且薄膜的應力也有隨之減小的趨勢。In this study we focused primarily on magnesium fluoride and lanthanum fluoride that promise a transparency at DUV wavelengths. We used 70° as the deposition angle and rotated the substrate stepwise by half a turn to form chevron structures by a single electron-beam source. We changed the rotation times in a specific thickness to investigate the changes in structure, stress, absorption band of water, surface roughness and linear birefringence. Structures were observed by scanning electron microscopy (SEM) photographs of deposition-plane fractures. Stress was measured by Phase-Shifting Interferometer. We use the Fourier Transform Infrared (FTIR) Spectroscopy to observe the absorption band of water of thin films. Surface Roughness was measured by atomic force microscopy (AFM). The Refractive indices in two different directions were determined from spectrometer equipped with a polarizer. We show that the linear birefringence would increase and the stress would decrease when the rotation times were increased.
Appears in Collections:	[Graduate Institute of Optics and Photonics] Electronic Thesis & Dissertation

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