脈衝式離子源助鍍氟化鎂薄膜之研究;The research of pulse ion beam-assisted deposition of magnesium fluoride thin film

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/6977

Title:	脈衝式離子源助鍍氟化鎂薄膜之研究;The research of pulse ion beam-assisted deposition of magnesium fluoride thin film
Authors:	練政廷;Cheng-Ting Lian
Contributors:	光電科學研究所
Keywords:	離子源;氟化鎂;ion source;magnesium fluoride
Date:	2007-06-28
Issue Date:	2009-09-22 10:33:46 (UTC+8)
Publisher:	國立中央大學圖書館
Abstract:	本論文是以熱阻舟蒸鍍系統配合脈衝式離子助鍍氟化鎂(MgF2)薄膜，研究脈衝式離子源對氟化鎂薄膜的光學特性、水氣吸收特性、微觀結構、表面粗糙度、應力與結晶特性的影響。　　光學特性方面，在Constant Mode 離子助鍍下，氟化鎂薄膜的折射率明顯增加了，但是在短波段有著較大的光學損耗，相較於Constant Mode，在Pulse Mode 離子助鍍下，薄膜在短波長的光學損耗明顯減小了，但是有水氣吸收的現象發生；微觀結構方面，在離子助鍍下，薄膜的柱狀結構變得較明顯，柱與柱之間較緻密，薄膜的表面粗糙度在離子助鍍下，隨著Beam Current 增加有變小的趨勢；結晶特性方面，在離子助鍍下，結晶型態並無改變，但是薄膜的結晶方向更一致；應力方面，在Beam Current 1.0A 隨著Beam Current 增加，薄膜的壓應力越來越大。　　The deposition of magnesium fluoride optical thin film by using thermal boat evaporation with pulse ion-assisted deposition (IAD) for UV application was investigated in this thesis. Due to the ion beam assistance, the optical properties and micro-structural properties of the magnesium fluorides thin films, including refractive index, surface roughness were significantly improved which are required in laser material processing and semiconductor lithography.
Appears in Collections:	[Graduate Institute of Optics and Photonics] Electronic Thesis & Dissertation

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