聚(氘化苯乙烯-b-甲基丙烯酸甲酯)薄膜於紫外光改質聚苯乙烯層之熱退火期間型態轉變探討;Morphological Evolution of Thermal Annealed Deuterated Polystyrene-block-Poly(methyl methacrylate) Thin Films on a UV-Treated Polystyrene Layer

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題名:	聚(氘化苯乙烯-b-甲基丙烯酸甲酯)薄膜於紫外光改質聚苯乙烯層之熱退火期間型態轉變探討;Morphological Evolution of Thermal Annealed Deuterated Polystyrene-block-Poly(methyl methacrylate) Thin Films on a UV-Treated Polystyrene Layer
作者:	楊濰甄;Yang, Wei-Chen
貢獻者:	化學工程與材料工程學系
關鍵詞:	嵌段共聚物;中子反射;聚(氘化苯乙烯-b-甲基丙烯酸甲酯);相轉變;Block Copolymer;Neutron Reflectivity;dPS-b-PMMA;Phase Transition
日期:	2018-07-09
上傳時間:	2018-08-31 11:31:21 (UTC+8)
出版者:	國立中央大學
摘要:	本研究主要藉由原子力顯微鏡、穿透式電子顯微鏡、低掠射小角度X-光散射和中子反射探討聚(氘化苯乙烯-b-甲基丙烯酸甲酯) (Deuterated Polystyrene-block-Poly(methyl methacrylate), dPS-b-PMMA)薄膜在具有中性表面之改質聚苯乙烯層(Polystyrene, PS)，於熱回火效應對微相分離結構有序性及排向性的結構影響。首先利用紫外光在充滿氮氣環境中(手套箱)照射交聯，而中性層的產生則是在空氣下照射紫外光獲得，再利用紫外光於空氣中照光，製備具有中性表面之PS層，再利用旋轉塗佈法將dPS-b-PMMA薄膜旋鍍於以紫外光照射交聯及中性化改質之PS層上，接著在真空環境中進行210-280 oC恆溫熱回火。其結果發現在低於270 oC下熱回火，dPS-b-PMMA表面容易形成一層dPS潤濕層，這是由於在此溫度條件下，dPS鏈段及PMMA鏈段之自由表面能()並未相同(即dPSPMMA，非中性表面)。在270 oC恆溫回火，可抑制dPS潤濕層，顯示在此條件下dPSPMMA。此外我們發現在270 oC恆溫回火不同時間，短時間熱回火則形成垂直取向的層板狀結構，而隨著回火時間增加，垂直層板狀轉變為垂直奈米柱狀，最後形成穿孔層狀奈米結構，在此論文中，我們將針對相轉變之機制做深入探討及解釋。 ;In this study, the structural evolution of deuterated polystyrene-block-poly (methyl methacrylate) (dPS-b-PMMA) thin films with thermal annealing of various durations on a layer of UV-irradiated polystyrene were studied by means of atomic force microscopy (AFM), transmission electron microscopy (TEM), grazing incident small-angle X-ray scattering (GISAXS) and neutron reflectivity (NR). Upon exposure to UV light in a glove box and in air, the PS layer was cross-linked and neutralized. dPS-b-PMMA thin films supported on the cross-linked/neutralized PS layer were prepared by spin coating and then the specimens were isothermally annealed at 210280∘C under vacuum. We found that thermal annealing at a temperature below 270 oC would preferentially grew a wetting layer of dPS on top. The formation of the preferential wetting layer is due to the fact that the surface energy (dPS) of the dPS block was not equal to that (PMMA) of the PMMA block. In other words, below 270 oC, the free surface of the dPS-b-PMMA was not neutral. When annealed at 270 oC, dPS-b-PMMA would have a neutral free surface. Besides, we found that 270 oC-thermal annealing of a short period first led to the formation of perpendicular-oriented lamellae. Nevertheless, prolonged thermal annealing produced phase transitions from standing lamellae to vertical nanocylinders and finally to perforated-layer-like nanostructures. In this thesis, we would propose possible mechanisms about the morphology evolution.
顯示於類別:	[化學工程與材料工程研究所] 博碩士論文

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