利用電漿聚合膜提升光學薄膜與塑膠基板之附著性;Improvement of Adhesion between Optical Film and Plastic Substrate by Using Plasma Polymerization Film

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题名:	利用電漿聚合膜提升光學薄膜與塑膠基板之附著性;Improvement of Adhesion between Optical Film and Plastic Substrate by Using Plasma Polymerization Film
作者:	盧冠為;Lu, Kuan-Wei
贡献者:	能源工程研究所
关键词:	電漿聚合膜;塑膠基板;附著性;光學薄膜
日期:	2018-07-30
上传时间:	2018-08-31 14:16:10 (UTC+8)
出版者:	國立中央大學
摘要:	光學元件應用於日常生活中許多電子產品當中，而攜帶式電子產品輕量化的需求日益增加，塑膠基材的使用也顯得更加重要。但由於光學元件製作時，薄膜在塑膠基板上始終有附著性的不足。本實驗引入含高表面自由能之材料，利用電漿聚合技術鍍製高分子聚合膜，並鍍上光學薄膜材料二氧化矽(SiO2)，探討各製程步驟對基板與光學薄膜之間附著性的改善原因。本實驗使用PMMA、330R、480R、PC等四種光學級塑膠作為基材，在電漿蝕刻處理後，可使接觸面積增加並提升機械咬合力，表面粗糙度最大可提升至61.9 nm。經電漿表面前處理之後，其表面官能基活化產生羥基(–OH)，可由水接觸角量測得知水接觸角最低可至超親水(低於10度)，表示表面自由能的提升；前處理之持久性不佳，故鍍製具有含氮官能基的高分子聚合膜，可更有效提升其表面自由能，並且可由XPS觀察鍍製前後含氮百分比之上升，最高提升至2.25倍。經上述所有步驟後鍍上光學薄膜，雖然蝕刻無法提升所有基板之附著性，但沉積聚合膜後，四種基板皆達到完整無脫膜的效果，並良好保持基板與光學薄膜之光學性質。;Optical components are used in many electronic products in daily life. The demand for lightweight and portable electronic products is increasing, therefore, the use of plastic substrates becomes important. However, the insufficient adhesion on plastic substrates has been a serious problem of the production of optical components. In this experiment, a material with high surface free energy is introduced to deposit a polymer film by using plasma polymerization technique. The optical thin film material silicon dioxide (SiO2) was coated to investigate the improvement of the adhesion between the substrate and the optical film in each process step. In the research, four plastic material, PMMA, 330R, 480R and PC, are used as substrates. The etching process has been adopted to increase the contact area. The surface roughness can be increased up to 61.9 nm. After plasma pretreatment on the substrate surface, the hydroxyl group are activated. The water contact angle can be measured less than 10 degrees, indicating that the surface free energy has been improved. Due to the poor persistent of the hydroxyl group, the polymer film with nitrogen-containing function groups is coated, which can improve the surface free energy more effectively. The increasing of the percentage of nitrogen can be observed by XPS. After the above steps, the optical films are coated. Although etching process cannot improve the adhesion of all the substrates, the four substrates achieve completely adhesion after depositing the polymer film. Besides, the optical property of the substrates is well maintained.
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