在近幾年來新穎的二維材料已經引起廣泛的興趣，因為它們具有奇特的結構與電性。雖然已經有研究成功地運用二維材料為基礎來建構奈米元件，但是要取得大面積高品質的二維材料薄膜以提供大量製造時，仍有許多的技術問題需要克服。在此計畫書中，我們計畫在劈裂雲母片的表面，運用二階段方法成長具有單晶性質的金屬膜，用以取代昂貴金屬單晶基板，並在這些金屬單晶薄膜表面，成長高品質的二維材料薄膜。如果計畫執行成功，除了能為學界與業界提供便宜的金屬單晶薄膜基板，並能取得在絕緣基板上成長大面積高品質二維材料薄膜的重要知識，將對發展二維材料為基礎的奈米電子工業做出重要的貢獻。 ;In recent years, novel two-dimensional (2D) materials have drawn tremendous interests because of their exotic structural and electronic properties. Although researchers have demonstrated successfully to construct nanodevices based on 2D materials, it remains great challenges to obtain large-area high-quality thin films of 2D materials routinely for mass production. In this proposal, we plan to use a two-step method to grow metallic single crystalline films on cleaved mica surfaces that can substitute expensive metallic single crystal substrates, and then grow high-quality overlayers of 2D materials on these metallic single crystalline films. If executed successfully, in addition to the cheap alternatives to metallic single crystals, this proposal will provide the key knowledge to grow large-area overlayers of 2D materials with much less defects and domain boundaries on insulating substrates. The results from this proposal will contribute significantly in the development of the 2D-material-based nanoelectronics.
