本論文提出以高分子聚合物光波導製程適用於4通道 x 25-Gbps 低密度分波多工器(Coarse Wavelength Division Multiplexing)單模光學收發模組之光學引擎。此光學引擎之輸入端於矽基板上整合了分佈回饋式雷射(Distributed Feedback Laser)、高分子聚合物光波導陣列波導光柵(Polymer Waveguide Based Array Waveguide Grating)作為多工器；接收端於玻璃基板上整合了高分子聚合物光波導陣列波導光柵(Polymer Waveguide Based Array Waveguide Grating)作為解多工器、1 x 4陣列PIN光電二極體(1 x 4 Array PIN Photodiode)。此高分子聚合物四波長陣列波導光柵之輸入及輸出埠光學界面，包含輸入端：雷射與高分子聚合物光波導之界面、高分子聚合物光波導與單模光纖之界面；接收端：單模光纖與高分子聚合物光波導之界面、高分子聚合物光波導與1 x 4陣列PIN光電二極體之界面。上述光學界面之間皆無透鏡設計，藉以簡化封裝製程。且在最惡劣條件下，輸入端通道中傳輸光的能量為 -0.64 dBm大於MSA所規範至少 -6.5 dBm；接收端通道中傳輸光的能量為 -7.08 dBm大於MSA所規範至少 -11.5 dBm。 以黃光製程製作長直高分子聚合物光波導，並藉由控制<100>矽基板晶向面之劈裂方向創造自然劈裂面，取代傳統與光波導端面研磨製程。設計光波導為矩形光波導，但實際製程為鐘形光波導。量測光波導尺寸W × H = 12 × 12 um^2的長直高分子聚合物光波導其平均插入損耗為 -7.23 dB，而模擬值為 -4.45 dB；波導尺寸W × H = 12 × 7 um^2的長直高分子聚合物光波導其平均插入損耗為 -8.13 dB，而模擬值為 -5.25 dB；波導尺寸W × H = 7 × 7 um^2的長直高分子聚合物光波導其平均插入損耗為 -9.95 dB，而模擬值為 -8.26 dB。 ;In this thesis, a none-lens-coupling optical interfaces using polymer optical waveguides is proposed to simplify the optical system of Coarse Wavelength Division Multiplexing 4-channel optical transceiver (CWDM4 optical Tx/Rx) with an aggregate data rate of 100 Gbps. The optical interface at the transmitting end of CWDM4 optical Tx/Rx including 4-channel distributed feedback lasers aligned to a polymer-based 4-wavelength Array Waveguide Grating (AWG) Multiplexer integrated on the silicon substrate. Between Multiplexer and Demultiplexer, a single-mode fiber is adopted to align. The optical interface at the receiving end of CWDM4 optical Tx/Rx, a 4-channel PIN Photodiodes assembled on a glass substrate is aligned to the polymer-based 4-wavelength AWG Demultiplexer. The results of numerical simulation show that the optical efficiencies at interfaces of transmitting and receiving ends are -0.64 and -7.08 dBm, respectively for the worst cases. Both values are superior to the specifications of -6.5 and -11.5 dBm of Multi-Source Agreement (MSA) of CWDM4 optical Tx and Rx, respectively. The pattern of a straight polymer optical waveguide is developed using the photo-lithography process. By defining the end facets of waveguide parallel to the crystal plane direction of <100> silicon wafer and cleaving it along the <100> direction, the end facets of waveguide is formed directly without the polish process. Although the rectangular contour is designed for original waveguides, however bell-shaped optical waveguides is obtained due to over exposure in photo-lithography process. The average measured insertion losses of bell-shaped optical waveguides are -7.23, -8.13, and -9.95 dB for various end facets W×H of 12×12, 12×7, and 7×7 um2, respectively. The corresponding simulated results are -4.45, -5.25, and -8.26 dB, respectively.
