English  |  正體中文  |  简体中文  |  Items with full text/Total items : 66984/66984 (100%)
Visitors : 23109202      Online Users : 284
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version

    Category

    Loading community tree, please wait....

    Year

    Loading year class tree, please wait....

    Items for Author "Ko,FH" 

    Return to Browse by Author

    Showing 8 items.

    Collection Date Title Authors Bitstream
    [化學工程與材料工程研究所] 期刊論文 2004 Effect of fluoroalkyl substituents on the reactions of alkylchlorosilanes with mold surfaces for nanoimprint lithography Chen,JK; Ko,FH; Hsieh,KF; Chou,CT; Chang,FC
    [化學工程與材料工程學系 ] 期刊論文 2010 Fabrication and enhanced field emission properties of novel silicon nanostructures Ravipati,S; Kuo,CJ; Shieh,J; Chou,CT; Ko,FH
    [化學工程與材料工程研究所] 期刊論文 2004 Fabrication of curved structures with electron-beam and surface structure characterization Chen,JK; Ko,FH; Chen,HK; Chou,CT; Chen,HL; Chang,FC
    [光電科學與工程學系] 期刊論文 2003 Fabry-Perot structures for attenuated phase-shifting mask application in ArF and F-2 lithography Chen,HL; Wu,HS; Lee,CC; Ko,FH; Fan,W; Hsieh,CI
    [光電科學與工程學系] 期刊論文 2003 Fabry-Perot type antireflective coatings for binary mask applications in ArF and F-2 excimer laser lithographies Chen,HL; Lee,CC; Chuang,YF; Liu,MC; Hsieh,CI; Ko,FH
    [薄膜技術研究中心] 期刊論文 2002 Low alkaline contamination bilayer bottom antireflective coatings in F-2 excimer laser lithography Chen,HL; Chuang,YF; Lee,CC; Ko,FH; Hsieh,CI; Huang,TY
    [光電科學與工程學系] 期刊論文 2003 Low alkaline contamination bottom antireflective coatings for both 193-and 157-nm lithography applications Chen,HL; Chuang,YF; Lee,CC; Hsieh,CI; Ko,FH; Wang,LA
    [化學工程與材料工程研究所] 期刊論文 2000 The effect of polymer modification on microwave digestion efficiency, thermal stability and plasma etching resistance for the photoresist Ko,FH; Lu,JK; Chu,TC; Chou,CT; Hsiao,LT; Lin,HC

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback  - 隱私權政策聲明