自製平板式直壓印機與其應用

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姓名

林裕博(Yu-Bo Lin) 查詢紙本館藏

畢業系所

光電科學與工程學系

論文名稱

自製平板式直壓印機與其應用
(Implementation of Solid Parallel-Plate Press and It's Applications)

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摘要(中)

壓印微影製程主要利用原先附有圖形之模具，借加壓方式將模具壓入阻劑中，使阻劑產生相對應圖形，此技術可製作奈米等級之結構，具有高解析度、快速生產以及低成本的特點。本研究以奈米壓印微影技術為基本概念，自行設計與製作了平板式直壓印機，以製作微奈米等級之元件。
本文利用聚二甲基矽氧烷 (PDMS)軟模以及溶膠-凝膠 (sol-gels)材料，於自製壓印機的實驗平台內，藉由壓力與溫度參數的控制，快速的壓印製作出微奈米尺寸之光柵元件。並依壓印實驗之結果，對鮮少文獻探討的壓印參數與元件之特徵尺寸做了比較與討論。此外，基於軟模微影之壓印材料與基板的豐富選擇性，本文亦成功將高折射率材料Ta2O5壓印於光學玻璃基板上，成功製作出具有波導功能的光柵。

摘要(英)

Nanoimprint lithography (NIL) is a high-resolution, speedy throughput and low cost parallel method in which surface patterns of a stamp is transferred into the material by the external force applied. In this research, the key concept of NIL method was used to fabricate micro/nano component in nanotechnology with the designed and implementation of self-made solid parallel-plate press (SPP) machine.
Within this work, the fabricating process is performed using a polydimethylsiloxane (PDMS) stamp and sol-gels materials with control the experimental parameters as pressure or temperature. The process is carried out inside the imprint device and a micro/nano grating structure was made. Additionally, the dependence of the characteristic size of the device on the imprint parameters was analyzed. Furthermore, the experiment also successfully imprints high refractive index line structure on glass substrate.

關鍵字(中)

★ 自製壓印機
★ 奈米壓印
★ 軟模微影

關鍵字(英)

★ soft lithography
★ nanoimprint

論文目次

目錄
中文摘要iv
英文摘要v
第一章緒論1
1-1微奈米光學元件製作1
1-2研究動機6
第二章平板式直壓印機之建立7
2-1系統要求7
2-2平板式直壓印架構8
2-3系統校正19
第三章元件的製作28
3-1母模製作29
3-2聚二甲基矽氧烷PDMS軟模具的翻模31
3-3壓印製作流程33
第四章實驗結果與討論40
4-1SOG之壓印特徵尺寸與壓印壓力40
4-2SOG之壓印特徵尺寸與壓印溫度55
4-3Ta2O5在光學玻璃上之壓印62
第五章結論65
參考文獻67

參考文獻

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指導教授

楊宗勳(Tsung-Hsun Yang)

審核日期

2010-7-5

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