博碩士論文 983207012 詳細資訊




以作者查詢圖書館館藏 以作者查詢臺灣博碩士 以作者查詢全國書目 勘誤回報 、線上人數:139 、訪客IP:3.17.173.165
姓名 陳建佑(Jian-You Chen)  查詢紙本館藏   畢業系所 光機電工程研究所
論文名稱 雷射掃描晶圓定位系統
(Wafer Positioning by Laser Scanning Method)
相關論文
★ MOCVD晶圓表面溫度即時量測系統之開發★ MOCVD晶圓關鍵參數即時量測系統開發
★ 應用螢光顯微技術強化RDL線路檢測系統★ 基於人工智慧之PCB瑕疵檢測技術開發
★ 基於 YOLO 物件辨識技術之 PCB 多類型瑕疵檢測模型開發★ 全場相位式表面電漿共振技術
★ 波長調制外差式光柵干涉儀之研究★ 攝像模組之影像品質評價系統
★ 雷射修整之高速檢測-於修整TFT-LCD SHORTING BAR電路上之應用★ 光強差動式表面電漿共振感測術之研究
★ 準共光程外差光柵干涉術之研究★ 波長調制外差散斑干涉術之研究
★ 全場相位式表面電漿共振生醫感測器★ 利用Pigtailed Laser Diode 光學讀寫頭在角度與位移量測之研究
★ 複合式長行程精密定位平台之研究★ 紅外波段分光之全像集光器應用
檔案 [Endnote RIS 格式]    [Bibtex 格式]    [相關文章]   [文章引用]   [完整記錄]   [館藏目錄]   [檢視]  [下載]
  1. 本電子論文使用權限為同意立即開放。
  2. 已達開放權限電子全文僅授權使用者為學術研究之目的,進行個人非營利性質之檢索、閱讀、列印。
  3. 請遵守中華民國著作權法之相關規定,切勿任意重製、散佈、改作、轉貼、播送,以免觸法。

摘要(中) 本論文提出一雷射掃描晶圓定位系統用來量測集束型設備中晶圓的
圓心位置。此定位系統是由雷射掃描系統與散射光偵測系統組成。利用振鏡
掃描器將雷射光線反射至感測區域形成一道掃描光線。當機械手臂輸送晶圓
通過掃描光線時,散射光偵測系統將接收到一光強度隨時間變化之散射光時
序訊號。根據散射光時序訊號與已知的速度及位置參數,晶圓位置演算法便
可計算出機械手臂運動速度與晶圓圓心位置。
為驗證系統之定位能力,使用四吋晶圓進行實驗。在以實驗速度為速度
參數之實驗中,定位精確度小於1.5mm;在以理論速度為速度參數之實驗中
,定位精確度則皆小於0.1mm。本系統亦可用於速度量測,速度量測之絕對
誤差小於1mm/s,量測精確度則低於0.7mm/s。
摘要(英) A laser scanning method for wafer positioning is proposeed to determine the center position of the wafer in the cluster tool. This positioning system incorporates a laser scanning system and a scattering light receiving system. The scanner is used to reflect a laser beam into a scanning line on the sensing area. As the wafer passes by the scanning line, a scattering light receiving system detects the time-sequence signal of the scattered lights. The velocity of a robot plate and the position of wafer ia determined by signal processing of the time-sequence signal.
4-inch wafer positioning experiment results demonstrate that the positioning system can be used to detectc the positioning of a wafer. The velocity measurement precision is under 0.7 mm/s, and the absolut error is about 1 mm/s.
The wafer positioning precision is 0.1 mm.
關鍵字(中) ★ 晶圓定位
★ 雷射掃描
★ 散射光時序訊號
關鍵字(英) ★ Scattering Light Signal
★ Wafer Positioning
★ Laser Scanning Method
論文目次 中文摘要                i
ABSTRACT               ii
目錄                  iii
表目錄                 v
圖目錄                 vi
符號說明                viii
第一章 緒論              1
 1-1 研究背景            1
 1-2 文獻回顧            2
  1-2-1 晶圓定位技術        2
  1-2-2 雷射掃描技術        6
 1-3 研究目的與方法         7
 1-4 論文架構            8
第二章 系統架構            9
 2-1 元件與儀器介紹         9
 2-2 雷射掃描晶圓定位系統      10
  2-2-1 雷射掃描系統        11
  2-2-2 散射光偵測系統       12
 2-3 小結              14
第三章 晶圓位置演算法         15
 3-1 定義定位系統座標系       15
 3-2 時間與角度資訊擷取       16
 3-3 機械手臂運動速度計算      17
 3-4 晶圓邊緣位置計算        18
 3-5 曲線擬合求晶圓圓心位置     19
 3-6 小結              20
第四章 實驗結果與討論         21
 4-1 實驗數據            21
  4-1-1 參考角度量測        21
  4-1-2 機械手臂運動速度量測    25
  4-1-3 晶圓定位實驗        26
 4-2 實驗討論            33
  4-2-1 量測準確度         33
  4-2-2 量測精確度         34
  4-2-3 速度量測對晶圓定位之影響  36
 4-3 小結              37
第五章 誤差分析            38
 5-1 系統誤差            38
  5-1-1 斜率誤差          39
  5-1-2 高度誤差          39
  5-1-3 參考角度誤差        40
  5-1-4 速度誤差          41
 5-2 隨機誤差            42
 5-3 小結              43
第六章 結論與未來展望         44
參考資料                45
參考文獻 [1] F. T. Rosenquist, B. Richardson, W. J. Fonsnight and A. C. Bonora, “Wafer mapping system”, U. S. Patent, No.6188323, 2001.
[2] P. C. Chung and T. L. Lu, “Wafer mapping apparatus”, U. S. Patent, No.6303939, 2001.
[3] R. M. Spencer and C. O. Lada, “Method and system for locating and positioning circular workpieces”, U. S. Patent, No.4833790, 1989.
[4] A. L. Adams and C. D. Head, “Semiconductor slice prealignment system”, U. S. Patent, No.4024944, 1977.
[5] H. S. Lee, J. W. Jeon, J. W. Kim, S. J. Jung and J. E. Byum, “A 12-inch wafer prealigner”, Microprocessors and Microsystems, Vol. 27, No. 4, pp. 151-158, 2003.
[6] D. Cheng and W. W. Zhang, “System and method for detecting the center of an integrated circuit wafer”, U. S. Patent, No.4819467, 1989.
[7] S. Shmookler, A. G.. Weinberg, “System and method for automated positioning of a substrate in a processing chamber”, U. S. Patent, No.5483138, 1996.
[8] W. R. Johanson, C. Stevens, S. Kleinke and D. Genetti, “Wafer centering system and method”, U. S. Patent, No. 6405101, 2002.
[9] R. Martinson, D. Shrivastava, M. Weis, “Method for active wafer centering using a single sensor”, U. S. Patent, No. 6760976, 2004.
[10] R. Fay, P. Peng, W. Chen, G. Tsai and J. F. Chang, “Wafer positioning device”, U. S. Patent, No. 6471464, 2002.
[11] W. S. Yoo and K. Kang, “Wafer alignment system and method”, U. S. Patent, No. 6516244, 2003.
[12] J. W. Lee, B. G. Lee and J. J. Lee, “Position error inspection for mounting wafer in cleaning device”, CGIV '08 Proceedings of the 2008 Fifth International Conference on Computer Graphics, Imaging and Visualisation, pp. 280-285, 2008.
[13] J. W. Lee, B. G. Lee, J. J. Lee and J. Yoon, “Position error inspection for mounting wafer in cleaning device using the radial shape board”, VIZ '09 Proceedings of the 2009 Second International Conference, pp. 247-252, 2009.
[14] V. F. Duma, A. G. Podoleanu and M. Nicolov, “Modeling a galvoscanner with an optimized scanning function”, Syrom 2009, pp. 539-548, 2010.
[15] V. Duma, “On-line measurements with optical scanners: metrological aspects”, Proc. SPIE, Vol. 5856, pp. 606-617, 2005.
[16] L. Beiser, “Fundamental architecture of optical scanning systems”, Applied Optics, Vol. 34, No. 31, pp. 7307-7317, 1995.
[17] R. P. Aylward, “Advanced galvanometer-based optical scanner design”, Sensor Review, Vol. 23, Iss. 3, pp. 216-222, 2003.
[18] R. P. Aylward, “The advances and technologies of galvanometer-based scanners”, Proc. SPIE, Vol. 3787, pp. 158-164, 1999.
[19] G. G. Baker and E. F. Boyle, “Wafer centration device”, U. S. Patent, No. 4880348, 1989.
[20] M. Mayo, “Pre-aligner”, U. S. Patent, No. 7042568, 2006.
[21] H. S. Lee, J. W. Jeon, J. W. Kim and S. J. Chung, “The development of a 12-inch wafer prealigner with optical character recognition”, The 27th Annual Conference of the IEEE Industrial Electronics Society, Vol. 1, pp. 215-219, 2001.
[22] I. D. Coope, “Circle fitting by linear and nonlinear least squares”, Journal of Otimization Theory and Applications” Vol. 76, No. 2, pp. 381-388, 1993.
[23] W. Gander, G. .H. Golub and R. Strebel, “Least-squares fitting of circles and ellipses”, BIT Numerical Mthematics, Vol. 34, No. 4, pp. 558-578, 1994.
[24] N. Chernov and C. Lesort, “Least squares fitting of circles”, Journal of Mathematical Imaging and Vision, Vol. 23, pp. 239-252, 2005.
[25] J. L. Dye and V. A. Nicely, “A general purpose curve fitting program for class and research use”, Journal of Chemical Education, Vol. 48, No. 7, pp. 443-448, 1971.
[26] D. Umbach and K. N. Jones, “A few methods for fitting circles to data”, IEEE Transactions on Instrumentation and Measurement, Vol. 52, Iss. 6, pp. 1881-1885, 2003.
[27] R. Fruhwirth, A. Strandlie W. Waltenberger and J. Wroldsen, “A review of fast circle and helix fitting”, Nuclear Instruments and Methods in Physics Research, Vol. 502, pp. 705-707,2003.
[28] W. Maddams, “The scope and limitations of curve fitting”, Applied Spectroscopy, Vol. 34, Iss. 3, pp. 245-267, 1980.
[29] C. Rusu, M. Tico, P. Kuosmanen and E. J. Delp, “Classical geometrical approach to circle fitting- review and new developments”, Journal of Electronic Imaging, Vol. 12, No. 1, pp. 179-193, 2003.
指導教授 李朱育(Ju-Yi Lee) 審核日期 2011-11-14
推文 facebook   plurk   twitter   funp   google   live   udn   HD   myshare   reddit   netvibes   friend   youpush   delicious   baidu   
網路書籤 Google bookmarks   del.icio.us   hemidemi   myshare   

若有論文相關問題,請聯絡國立中央大學圖書館推廣服務組 TEL:(03)422-7151轉57407,或E-mail聯絡  - 隱私權政策聲明