參考文獻 |
參考文獻
1. 石原茂久,「熱機能性木質複合材料素材開發」,第51 回木研公開演講會,23~29 頁,京都大學,日本,1996 年8 月。.
2. M.Ohata, M.Aoki,S.Yoshizawa ,“Effect of carbonization condition on microstructure of bamboo charcoal with practical furnace”, Meisei University
3. 許玲瑛,「多階段炭化對孟宗竹炭基本性質及吸附能力之影響」,國立中興大學,碩士論文,民國97 年。
4. 江?慧、??升、?本?、岳永德和???,「炭化?度?竹炭微??构及?性能的影?」,新型炭材料,第十九卷第四期,249~253 頁,93年12 月。
5. 劉正字,「竹炭的功能及其利用」,台灣林業,第三十三卷第三期,30~36頁,96 年6 月。
6. 朱江?、?正宏、康?宇、傅金和和岳永德,「竹炭的性能和?用研究?展」,材料??,第二十卷第四期,41~43 頁,95 年4 月。
7. 戴嘉璐、郭興忠、楊 輝和涂志龍,「竹炭微結構的研究」,材料科學與工程學報,第二十五卷第五期,743~745 頁,96 年1 月。
8. 藍浩繁、賴宏亮和鄧維豐,「孟宗竹竹炭性質之研究」,作物、環境與生物資訊,第五期,180~186 頁,97 年9 月。
9. K. H. Hou, M. D. Ger, L. M. Wang and S. T. Ke, The wear behaviour of electro-codeposited Ni–SiC composites, Wear, Vol. 253 pp. 994-1003, 2002.
10. 秋能信,「矽晶圓之超精密輪磨及機化學拋光技術」,機械工業雜誌,85
年5月。
11. M. Ghouse, M. Viswanathan and E. G. Ramachandran, Occlusion Plating of Copper-Silicon Carbide Composites, Metal Finishing, Vol. 78, pp. 331-35, 1980.
12. J. Zahavi amd J. Hazan, Electrodeposited Nickel Composites Containing Diamond Particles, Plating Surface Finishing , Vol. 70, pp. 57-61, 1983.
13. E. C. Lee and J. W. Choi, A study on the mechanism of formation of electrocodeposited Ni–diamond coatings, Surface and Coatings Technology, Vol. 148, pp. 234-240, 2001.
14. L. Du, B. Xu, S. Dong, H. Yang and W. Tu, Study of tribological characteristics and wear mechanism of nano-particle strengthened nickel-based composite coatings under abrasive contaminant lubrication, Wear, Vol. 257, pp. 1058-1063, 2004.
15. L. Wang, Y. Gao, H. Liu, Q. Xue and T. Xu, Effects of bivalent Co ion on the co-deposition of nickel and nano-diamond particles, Surface & Coatings Technology, Vol. 191, pp. 1-6, 2005.
16. T. Tsubota, S. Tanii, T. Ishida, M. Nagata and Y. Matsumoto, Composite electroplating of Ni and surface-modified diamond particles with silane coupling regent, Diamond & Related Materials, Vol. 14, pp. 608-612, 2005.
17. H. K. Lee, H. Y. Lee and J. M. Jeon, Codeposition of micro- and nano-sized SiC particles in the nickel matrix composite coatings obtained by electroplating, Surface & Coatings Technology, Vol. 201, pp. 4711-4717, 2007.
18. N. K. Shrestha, T. Takebe and T. Saji, Effect of particle size on the co-deposition of diamond with nickel in presence of a redox-active surfactant and mechanical property of the coatings, Diamond & Related Materials, Vol. 15, pp. 1570-1575, 2006.
19. H. K. Park, H. Onikura, O. Ohnishi and A. Sharifuddin, Development of micro-diamond tools through electroless composite plating and investigation into micro-machining characteristics, Precision Engineering, Vol. 34, pp. 376-386, 2010.
20. J. C. Hung, W. C. Wu, B. H. Yan, F. Y. Huang and K. L. Wu, Fabrication of a micro-tool in micro-EDM combined with co-deposited Ni–SiC composites for micro-hole machining, Journal of Micromechanics and Microengineering, Vol. 17, pp. 763-774, 2007.
21. F. A. Khalid, O. Beffort, U. E. Klotz, B.A. Keller and P. Gasser, Microstructure and interfacial characteristics of aluminium–diamond composite materials, Diamond and Related Materials, Vol. 13, pp. 393-400, 2004.
22. L. Zhang and Hiroaki Tanaka, Atomic scale deformation in silicon monocrystals induced by two-body and three-body contact sliding, Tribology International, Vol. 31 8, pp. 425-433, 1998.
23. J. Grillaert, M. Meuris, N. Heylen, K. Devriendt and E. Vrancken, Modelling step height reduction and local removable rates based on pad-substrate interactions, CMP-MIC conference, California, pp.79, 1998.
24. N. Kobayashia, Y. Wub and M. Nomurab, Precision treatment of silicon wafer edge utilizing ultrasonically assisted polishing technique, Journal of Materials Processing Technology, Vol. 201, pp. 531-535, 2007.
25. A. Q. Biddut, L. C. Zhang, Y. M. Ali and Z. Liu, Damage-free polishing of monocrystalline silicon wafers ithout chemical additives, Scripta Materialia, Vol. 59, pp.1178-1181, 2008.
26. M. Tokoro, Y. Aiyama, M. Masuko, A. suzuki, I. Ito and K. Yamamoto, Improvement of tribological characteristics under water lubrication of LC-coatings by surface polishing, Wear, Vol. 267, pp. 2167-2172, 2009.
27. M. G. Hamblin and G. W. Stachowiak, A multi-scale measure of particle abrasivity, and its relation to two-body abrasive wear, Wear, Vol. 190, pp. 190-196, 1995.
28. Y. Tani, T. Okuyama S. Murai, Y. Kamimura and H. Sato, Development of silica polyvinyl alcohol wheels for wet mirror grinding of Silicon wafer, Annals of the CIRP, Vol. 56, 361-364, 2007.
29. T. Kurobe, T. Fujimura, and H. Ikeda, Nanopolishing of silicon wafers using ultrafine-dispersed diamonds, Physics of the Solid State, Vol. 46, pp. 751-754, 2004.
30. T. J. Chen, Y. C. Chiou and R. T. Lee, Grinding characteristics of diamond film using composite electro-plating in-process sharpening method, International Journal of Machine Tools & Manufacture, Vol. 49, pp. 470-477, 2009.
31. A. Une, K. Yoshitomi, M. Mochida and N. Ogasawara, Influence of pin chuck ring seals and polishing steps on wafer flatness, Microelectronic Engineering, Vol. 87, pp. 1646-1649, August 2010.
32. D. H. Hwang, D. E. Kim and S. J. Lee, Influence of wear particle interaction in the sliding interface on friction, Wear, Vol. 225-229, pp. 427-439, 1999.
33. Z. Zhang , Y. Meng, D. Guo, L. Wu, Y. Tian and R. Liu, Material removal mechanism of precision grinding of soft-brittle CdZnTe wafers, Int J Adv Manuf Technolr, Vol. 46, pp. 563-569, 2010.
34. Z. Zhong, Surface finish of precision machined advanced materials, Journal of Materials Processing Technology, Vol. 122, pp. 173-178, 2002.
35. J. Janus, G. Fauxpoint, Y. Arntz, H. Pelletier and O. Etienne, Surface roughness and morphology of three nanocomposites after two different polishing treatments by a multitechnique approach, Dental Materials, Vol. 26, pp. 416-425, May 2010.
36. R. I. Trezona, D. N. Allsopp and I. M. Hutchings, Transitions between two-body and three-body abrasive wear: influence of test conditions in the microscale abrasive wear test, Wear, Vol. 225-229, pp. 205-214, 1999.
37. J. D. Gates, Two-body and three-body abrasion: A critical discussion, Wear, Vol. 214, pp. 139-146, 1998.
38. A. P. Harsha and U. S. Tewari, Two-body and three-body abrasive wear behaviour of polyaryletherketone composites, Polymer Testing, Vol. 22, pp. 403-418, 2003.
39. P. Agrawal, R. Narulkar, S. Bukkapatnam, L. M. Raff and R. Komanduri, A phenomenological model of polishing of silicon with diamond abrasive, Tribology International, Vol. 43, pp. 100-107, 2010.
40. 黃韋翰,「新式超精密拋光機之矽晶圓拋光特性研究」,國立中山大學,碩士論文,民國92年。
41. N. Kobayashi, Y. Wu, M. Nomura and T. Sato, Precision treatment of silicon wafer edge utilizing ultrasonically assisted polishing technique, Journal of Materials Processing Technology, Vol. 201, pp. 531-535, 2008.
42. 林秉威,「竹炭拋光矽晶圓特性之研究」,國立中央大學,碩士論文,民國99年。
43. I. Zarudi and B. S. Han, Deformation and material removal rate in polishing silicon wafers, Journal of Materials Processing Technology, Vol. 140, pp. 641-645, 2003.
44. N. Gulielmi, Kinetics of the Deposition of inert particles from electrolytic baths, Journal of the Electrochemical Society, Vol. 119, pp. 1009-1012, 1972.
45. J. P. Celis, J. R. Roos and C. Buelens, A mathematical model for the electrolytic codeposition of particles with a metallic matrix, Journal of the Electrochemical Society, Vol. 134, pp. 1402-1408, 1987.
46. B. J. Hwang, C. S. Hwang, “Mechanism of codeposition of silicon carbide with electrolytic cobalt, Journal of the Electrochemical Society, Vol. 140, pp. 979-984, 1993.
47. C. Chen, M. Leipold, Fracture toughness of silicon, American Ceramic Society Bulletin, vol. 59, pp.469-472, 1980.
48. P. B. Hirsch, 「脆性-延性遷移基礎」,日本????. 第二十九卷,5頁,89 年。
49. L. M. Cook, Chemical processes in glass polishing, Journal of Non-Crystalline Solids, Vol. 120, pp.152-171, 1990.
50. 張國龍,「矽晶圓拋光時溫度及磨粒對表面性質之影響」,國立清華大學,博士論文,民國88 年。
|