參考文獻 |
[1] D.J. Nagel and M.E. Zaghloul , MEMS : Micro Techanology : Mega
Impact, IEEE Circuit Devices Magazine. Vol. 28, pp. 14-25, 2001.
[2] K. Kurihara, T. Nakano, H. Ikeya, M. Ujiie and J. Tominaga, “High-speed
fabrication of large-area nanostructure optical devices”,
Microelectronic Engineering,Vol. 85, pp. 1197-1201, 2008.
[3] Y. Ozaki, T.Ohyama, T. Yasuda and I. Shimoyama , “An air flow sensor modeled on wind receptor hairs of insects”, Proc. MEMS, pp. 531-536, 2000.
[4] E.V. Mukerjee, A.P. Wallace, K.Y. Yan, D.W. Howard, R.L. Smith, S.D.
Collins, “Vaporizing liquid microthruster”, Sensors and Actuators, Vol.83,
pp. 231-236, 2000.
[5] G.M.Whitesides,“The origins and the future of microfluidics”, Nature, Vol. 422, pp. 368-373, 2006.
[6] L.J.Lee , “BioMEMS and Micro-/Nano-Processing of Polymers-An
Overview”, Annals of biomedical Engineering, Vol.34, pp. 25-46, 2003.
[7] 楊錫行, 黃廷合 編著, 微機械加工概論, 全華科技圖書股份有限公司, 2004.
[8] D. Zhu1, K. Wang and N. S. Qu, “ Micro wire electrochemical
cutting by using in situ fabricated wire electrode”, CIRP Annals -
Manufacturing Technology , Vol.56, pp.241-244, 2007.
[9] X. M. Zhao, Xia Y,G. M. Whitesides, “Soft lithographic methods for
nano-fabrication, ” Journal of Materials Chemistry, Vol.7, pp. 1069-1074, 1997.
[10] D. Qin, Y. N. Xia, and G. M. Whitesides, “Soft lithography for micro- and nanoscale patterning, ”Nat. Protoc. Vol.5, pp. 491-502, 2010.
[11] Y. Kawamura, K. Toyoda, and S. Namba, “Effective deep ultraviolet photoetching of polymethyl methacrylate by an exclmer laser”, Appl. Phys. Lett. Vol. 40, pp.374-375, 1982.
[12] S. Kawata, H.-B. Sun, T. Tanaka, and K. Takada, “Finer features for functional microdevices”, Nature Vol. 412, pp. 697-698, 2001.
[13] L. Strong and G. M. Whitesides, "Structures of self-assembled monolayer films of organosulfur compounds adsorbed on gold single-crystals - Electron-Diffraction Studies", Langmuir ,Vol.4, pp. 546-558, 1988.
[14] G. M. Whitesides and B. Grzbowski, “Self-assembly at all scales”, Sciencei, Vol.295, pp. 2418 -2421, 2002.
[15] S. Y. Chou and P. R. Krauss, “Imprint lithography with 25-nanometer resolution”, Science Vol.272, pp.85-87, 1996.
[16] H. Ahmed, “Electron-beam lithography for microcircuit fabrication”, Electronics and Power , pp. 433-436, 1976.
[17] T. H. P. Chang, M. Mankos, K. Y. Lee, and L. P. Muray, “Multiple electron-beam lithography”, Microelectron. Eng, pp. 117-135, 2001.
[18] M. Kuwahara , C. Mihalceaa, N. Atodaa, J. Tominagaa, H. Fujib, T. Kikukawac,“Thermal lithography for 0.1 mm pattern fabrication” Microelectronic. Eng., Vol. 61-62, pp. 415-420, 2002.
[19] C. P. Liu , Y. X. Huang , C. C. Hsu , T. R. Jeng, and J. P. Chen, “Nanoscale fabrication using thermal lithography technique with blue laser”, IEEE Trans. Magnetics, Vol. 45, pp.2206-2208, 2009.
[20] A. S. Basu, S. McNamara, and Y. B.Gianchandani, “Scanning thermal lithography: Maskless, submicron thermochemical patterning of photoresist by ultracompliant probes”, J. Vac. Sci. Technol. Vol. 22, pp. 3217-3220, 2004.
[21] Y. M. Hua, S. Saxena, H. Clifford, W. P. King, “ Nanoscale thermal lithography by local polymer decomposition using a heated atomic force microscope cantilever tip” , J. Micro/Nanolith.MEMS MOEMS,Vol. 6, 023012, pp.1-6, 2007.
[22] A. Schmidt X. Chen, and G. Chen, “ Contact thermal lithography”,IMECE, 2005.
[23] M.T. Hung, J. Kim, and Y. S. Ju, “Exploration of Thermolithography for micro- and nanomanufacturing,” Appl. Phys. Lett. Vol. 88, 123110, 2006.
[24] A. Reiser, J.P. Huang, X. He, T.F. Yeh, S. Jha, H.Y. Shih, M.S. Kim, Y.K. Han, and K. Yan, “The molecular mechanism of novolak–diazonaphthoquinone resists, ” European Polymer Journal vol. 38, pp.619–629, 2002.
[25] 龍文安, 半導體微影技術, 五南圖書公司, 2004.
[26] M. Spak, D. Mamato, S. Jain, and D. Durham, “Mechanism and lithographic evaluation of image reversal in AZ 5214 photoresist ”, AZ Electronic Material.
[27] J. D. Plummer, M. D. Deal, P. B. Griffin著, 羅正忠, 李嘉平, 鄭湘原 譯, “半導體工程”,台灣培生教育出版股份有限公司, 2005.
[28] J. Aizenberg, J. A. Rogers, K. E. Paul, and G. M. Whitesides, “Imaging profiles of light intensity in the near field: applications to phase-shift photolithography”, Applied Optic, Vol. 37, pp.2145-2152, 1998.
[29] F. P. Incropera, D. P. Dewitt, Fundamentals of heat and mass transfer, 2002.
[30] E. Gogolides E. Tegou, K. Beltsios b, K. Papadokostakib, and M.
Hatzakis, “Thermal and mechanical analysis of photoresist and silylated photoresistfilms: Application to AZ 5214”, Microelectronic Eng. Vol. 30, pp.267-270, 1996.
[31] K. Kato and K. Ito, “Dynamic transition between rubber and sliding states
attributed to slidable cross-links”, Soft Matter, Vol.7, pp. 8737-8740, 2011.
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