| dc.description.abstract | The heater is a key component in MOCVD reaction chamber. The goal of the simulation results can be applied to inside heating system of Veeco D-180. In order to keep the susceptor surface temperature to be unformed, this study has completed eight analyses: two-heating zones analysis, susceptor material analysis, distance analysis (between the filament and the susceptor), vapor chamber analysis, three-heating zones analysis, susceptor rotation and hydrogen inlet flow analysis, shield board analysis, and optimal heater design analysis. It is found that susceptor surface temperature is influenced mostly by the results from susceptor material analysis, vapor chamber analysis, and three-heating zones analysis.
From these analyses, the optimal conditions of heater design can be obtained from the results based on susceptor material (SiC), distance (4 mm), vapor chamber (molybdenum), three heating zones, susceptor rotation (200 rpm), hydrogen inlet flow (30 slm), adding shield board and power inputs settings for this key component. Finally, the best results from these analyses are the temperature difference of susceptor surface 4.1℃, the temperature difference of wafer surface 2.4℃, and the susceptor surface temperature uniformity 0.09%. The study can demonstrate successfully that the simulated and optimal design of MOCVD high temperature heating system can be received by using numerical analysis. | en_US |