DC 欄位 |
值 |
語言 |
DC.contributor | 材料科學與工程研究所 | zh_TW |
DC.creator | 王榆茜 | zh_TW |
DC.creator | Yu-cian Wang | en_US |
dc.date.accessioned | 2016-3-30T07:39:07Z | |
dc.date.available | 2016-3-30T07:39:07Z | |
dc.date.issued | 2016 | |
dc.identifier.uri | http://ir.lib.ncu.edu.tw:88/thesis/view_etd.asp?URN=100389005 | |
dc.contributor.department | 材料科學與工程研究所 | zh_TW |
DC.description | 國立中央大學 | zh_TW |
DC.description | National Central University | en_US |
dc.description.abstract | 一維透明導電氧化物奈米材料被認為是未來軟性電子產品的關鍵材料之一。目前氧化物奈米線若採用低溫製程製備則多有成長速率太慢的缺點;若以高溫成長方式,則必須多一道繁瑣的奈米線轉移至目標基板的步驟,因此開發低溫快速成長製程將能促進奈米線落實在實際應用層面。
我們首次以電漿迴旋共振化學氣象沉積法製備氧化銦奈米線。以蒸鍍之銦奈米粒子作為金屬來源,藉由調整不同氧分壓獲得不同表面形貌與結晶結構的氧化銦奈米線。在此研究中觀察到在氧分壓低的成長範圍下(PO2<5E-2 mTorr),金屬銦擴散至氧化銦薄膜表面後,發生氧化反應後形成InOx作為成長奈米線的前驅物來源。而在氧分壓高的成長範圍下(2E-1zh_TW | |
dc.description.abstract |
One-dimensional transparent conductive oxide nanomaterial is considered one of the key materials of flexible electronics products in future. Currently, the low temperature preparation process for oxide nanowire has the disadvantage of low growth rate; if use high temperature preparation process, it must add a tedious post-growth transfer step. Therefore, developing low temperature and rapid growth process will be able to promote nanowires for applications.
Plasma-assisted growth of indium oxide nanowires (InO-NWs) were performed in electron cyclotron resonance (ECR) plasma with an O2-Ar system using indium nanocrystals as seed particles. In the low O2 partial pressure (PO2<5E-2 mTorr), the directly oxidation of indium which is diffusion from inner core through a thin InO layer by indium diffused from inner core to the surface of the thin InO layer can serve as the nucleation sites on the surface of thin InO layer. The morphologies and crystallinity varied with the O2 partial pressure. It high O2 partial pressure (2E-1en_US | |
DC.subject | 氧化銦 | zh_TW |
DC.subject | 一維奈米結構 | zh_TW |
DC.subject | 電漿輔助 | zh_TW |
DC.subject | 低溫成長 | zh_TW |
DC.subject | 氧化作用 | zh_TW |
DC.subject | 抗反射 | zh_TW |
DC.subject | indium oxide | en_US |
DC.subject | one-dimensional nanostructures | en_US |
DC.subject | plasma-assisted | en_US |
DC.subject | low-temperature growth | en_US |
DC.subject | oxidation | en_US |
DC.subject | antireflection | en_US |
DC.title | 電漿輔助低溫成長一維氧化銦奈米結構 | zh_TW |
dc.language.iso | zh-TW | zh-TW |
DC.title | Low temperature plasma-assisted growth of one-dimensional indium oxide nanostructures | en_US |
DC.type | 博碩士論文 | zh_TW |
DC.type | thesis | en_US |
DC.publisher | National Central University | en_US |