博碩士論文 101323091 完整後設資料紀錄

DC 欄位 語言
DC.contributor機械工程學系zh_TW
DC.creator董家威zh_TW
DC.creatorChia-Wei Tungen_US
dc.date.accessioned2014-10-9T07:39:07Z
dc.date.available2014-10-9T07:39:07Z
dc.date.issued2014
dc.identifier.urihttp://ir.lib.ncu.edu.tw:88/thesis/view_etd.asp?URN=101323091
dc.contributor.department機械工程學系zh_TW
DC.description國立中央大學zh_TW
DC.descriptionNational Central Universityen_US
dc.description.abstract雙光子聚合(Two-photon Polymerization, TPP)微製造技術由於可製作任意微/奈米尺寸級之複雜立體外型結構,運用領域廣泛,因而成為熱門之研究。在目前相關研究中,提高TPP製程效率與良率、與目標物品精度,一直是各方專家相繼努力之方向。本論文利用高斯光束推導出不同能量之能量均勻橢圓體、統計學上目標函式,計算出最適合雷射曝光位置,使得欲加工之微結構體素重疊能量均一以達到雷射曝光最佳化,提高微結構之尺寸精度,並且降低聚合時發生微爆炸之機率。最後本文提出幾個微結構範例顯示此方法改良之最佳化。zh_TW
dc.description.abstractDue to Two-Photon Polymerization(TPP) micro-fabrication technology, it can be made in any three-dimensional complex shape and structure of micro/nano scale ,which is used in a wide range of fields , TPP micro-fabrication has become a popular issue. In the present studies , improving fabrication efficiency , micro-structure quality and enhancing object profile accuracy , all of these mentioned above has been already strive to do in every area of expert . This paper use Gauss Beam derivate many different uniform energy ellipsoid and built object function of statistics to calculate suitable laser exposure position . Not only micro structure voxel overlap ratio can become more uniform, which makes profile more accurate, but lower down the probability of micro-explosion when the structure in polymerization . At last , this paper will demonstrate some micro structure example before optimizing and after optimizing to prove this optimization feasibility.en_US
DC.subject雙光子聚合技術zh_TW
DC.subject雙光子吸收zh_TW
DC.subject微製造zh_TW
DC.subject最佳化zh_TW
DC.subject高斯光束zh_TW
DC.subject雷射曝光zh_TW
DC.subjectTwo-Photon Polymerizationen_US
DC.subjectTwo-Photon absorben_US
DC.subjectmMcro-fabricationen_US
DC.subjectOptimizationen_US
DC.subjectGauss Beamen_US
DC.subjectLaser Exposureen_US
DC.title雙光子聚合微製造技術以能量均勻橢圓體為基之曝光時間最佳化研究zh_TW
dc.language.isozh-TWzh-TW
DC.titleThe Optimization of Exposure Time based on Uniform Energy Ellipsoid for Two-photon Polymerization Micro-manufacturingen_US
DC.type博碩士論文zh_TW
DC.typethesisen_US
DC.publisherNational Central Universityen_US

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